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Nanotribology of transition metal dichalcogenide flakes deposited by chemical vapour deposition: The influence of chemical composition and sliding speed on nanoscale friction of monolayers

Nanotribology of transition metal dichalcogenide flakes deposited by chemical vapour deposition: The influence of chemical composition and sliding speed on nanoscale friction of monolayers
Nanotribology of transition metal dichalcogenide flakes deposited by chemical vapour deposition: The influence of chemical composition and sliding speed on nanoscale friction of monolayers

We present nanoscale frictional analysis of three commonly used transition metal dichalcogenide (TMD) monolayers, WS 2, MoSe 2 and WSe 2, deposited by chemical vapour deposition (CVD). The monolayers were characterised by Raman spectroscopy, photoluminescence spectroscopy (PL), and X-ray spectroscopy (XPS), to determine the composition of the coating and confirm monolayer structure. Nanoscale frictional analysis was performed by atomic force microscopy (AFM). Load-dependent frictional behaviour was measured at different sliding speeds to quantitatively assess friction on each sample. All samples experienced low nanoscale friction, with the lowest friction observed on WSe 2. The friction was independent of sliding speed within the analysed range. Furthermore, monolayer TMDs significantly increase the operational load range by at least one order of magnitude when compared to SiO 2 substrate.

Chemical vapour deposition, atomic force microscopy, monolayers, nanotribiology, transition metal dichalcogenides
0169-4332
Rapuc, Ales
21334fb1-02e8-4def-a6a2-814eb28014d2
Wang, He
0bb8fa1d-de57-42f1-935c-369731be4407
Polcar, Tomas
c669b663-3ba9-4e7b-9f97-8ef5655ac6d2
Rapuc, Ales
21334fb1-02e8-4def-a6a2-814eb28014d2
Wang, He
0bb8fa1d-de57-42f1-935c-369731be4407
Polcar, Tomas
c669b663-3ba9-4e7b-9f97-8ef5655ac6d2

Rapuc, Ales, Wang, He and Polcar, Tomas (2021) Nanotribology of transition metal dichalcogenide flakes deposited by chemical vapour deposition: The influence of chemical composition and sliding speed on nanoscale friction of monolayers. Applied Surface Science, 556, [149762]. (doi:10.1016/j.apsusc.2021.149762).

Record type: Article

Abstract

We present nanoscale frictional analysis of three commonly used transition metal dichalcogenide (TMD) monolayers, WS 2, MoSe 2 and WSe 2, deposited by chemical vapour deposition (CVD). The monolayers were characterised by Raman spectroscopy, photoluminescence spectroscopy (PL), and X-ray spectroscopy (XPS), to determine the composition of the coating and confirm monolayer structure. Nanoscale frictional analysis was performed by atomic force microscopy (AFM). Load-dependent frictional behaviour was measured at different sliding speeds to quantitatively assess friction on each sample. All samples experienced low nanoscale friction, with the lowest friction observed on WSe 2. The friction was independent of sliding speed within the analysed range. Furthermore, monolayer TMDs significantly increase the operational load range by at least one order of magnitude when compared to SiO 2 substrate.

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More information

Accepted/In Press date: 2 April 2021
e-pub ahead of print date: 16 April 2021
Published date: 1 August 2021
Additional Information: Funding Information: This work is supported by H2020 MSCA ITN project Solution No. 721642. T.P. also acknowledges support from the project OPVVV Novel nanostructures for engineering applications No. CZ.02.1.01/0.0/0.0/16_026/0008396. Publisher Copyright: © 2021 Elsevier B.V.
Keywords: Chemical vapour deposition, atomic force microscopy, monolayers, nanotribiology, transition metal dichalcogenides

Identifiers

Local EPrints ID: 448710
URI: http://eprints.soton.ac.uk/id/eprint/448710
ISSN: 0169-4332
PURE UUID: c4a201ac-de2d-4620-91a2-82485ff0da06
ORCID for Tomas Polcar: ORCID iD orcid.org/0000-0002-0863-6287

Catalogue record

Date deposited: 30 Apr 2021 16:33
Last modified: 17 Mar 2024 06:31

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Contributors

Author: Ales Rapuc
Author: He Wang
Author: Tomas Polcar ORCID iD

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