Resistive switching behavior of Ga doped ZnO-nanorods film conductive bridge random access memory
Resistive switching behavior of Ga doped ZnO-nanorods film conductive bridge random access memory
The influence of Ga dopant on resistive switching behavior of ZnO-nanorods film conducting bridge random access memory was investigated. Using a hydrothermal process, we grew vertically well-aligned and uniform Ga doped ZnO (GZO)-NRs films on transparent glass substrates to fabricate Cu/TiW/GZO-NRs/Indium Tin Oxide/Glass devices. The GZO-NRs film provides a diffusion path for the Cu ions to form a conducting bridge; thus, reducing the formation of a branched filament. The Ga dopant induces a significant improvement in switching distribution of high resistance states (HRS) and low resistance states (LRS). The 1.5 mol% Ga doped device exhibits good retention up to 104 s and high HRS/LRS ratio of 30 times. Therefore, our proposed device structure may be a good candidate for future conductive-bridge resistive random access memory application.
828-833
Singh, Pragya
8fb95fa7-5174-48d9-b5ed-29c5f2574c5c
Simanjuntak, Firman Mangasa
a5b8dd07-002c-4520-9f67-2dc20d2ff0d5
Kumar, Amit
bac0df72-a532-4f39-8388-44991957df02
Tseng, Tseung-Yuen
b25672b0-7cd2-4c52-bb91-14d56d2777a9
30 August 2018
Singh, Pragya
8fb95fa7-5174-48d9-b5ed-29c5f2574c5c
Simanjuntak, Firman Mangasa
a5b8dd07-002c-4520-9f67-2dc20d2ff0d5
Kumar, Amit
bac0df72-a532-4f39-8388-44991957df02
Tseng, Tseung-Yuen
b25672b0-7cd2-4c52-bb91-14d56d2777a9
Singh, Pragya, Simanjuntak, Firman Mangasa, Kumar, Amit and Tseng, Tseung-Yuen
(2018)
Resistive switching behavior of Ga doped ZnO-nanorods film conductive bridge random access memory.
Thin Solid Films, .
(doi:10.1016/j.tsf.2018.03.027).
Abstract
The influence of Ga dopant on resistive switching behavior of ZnO-nanorods film conducting bridge random access memory was investigated. Using a hydrothermal process, we grew vertically well-aligned and uniform Ga doped ZnO (GZO)-NRs films on transparent glass substrates to fabricate Cu/TiW/GZO-NRs/Indium Tin Oxide/Glass devices. The GZO-NRs film provides a diffusion path for the Cu ions to form a conducting bridge; thus, reducing the formation of a branched filament. The Ga dopant induces a significant improvement in switching distribution of high resistance states (HRS) and low resistance states (LRS). The 1.5 mol% Ga doped device exhibits good retention up to 104 s and high HRS/LRS ratio of 30 times. Therefore, our proposed device structure may be a good candidate for future conductive-bridge resistive random access memory application.
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Published date: 30 August 2018
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Local EPrints ID: 448769
URI: http://eprints.soton.ac.uk/id/eprint/448769
ISSN: 0040-6090
PURE UUID: b65fa3c4-73ca-475e-9100-201e0628dccd
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Date deposited: 05 May 2021 16:31
Last modified: 17 Mar 2024 03:59
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Author:
Pragya Singh
Author:
Firman Mangasa Simanjuntak
Author:
Amit Kumar
Author:
Tseung-Yuen Tseng
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