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Tungsten disulfide thin films via electrodeposition from a single source precursor

Tungsten disulfide thin films via electrodeposition from a single source precursor
Tungsten disulfide thin films via electrodeposition from a single source precursor
We report a simple process for the electrodeposition of tungsten disulfide thin films from a CH2Cl2-based electrolyte using a tailored single source precursor, [NEt4]2[WS2Cl4]. This new precursor incorporates the 1:2 W:S ratio required for formation of WS2, and eliminates the need for an additional proton source in the electrolyte to remove excess sulfide. The electrochemical behaviour of [NEt4]2[WS2Cl4] is studied by cyclic voltammetry and electrochemical quartz crystal microbalance techniques, and the WS2 thin films are grown by potentiostatic electrodeposition.
1359-7345
10194-10197
Thomas, Shibin
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Greenacre, Victoria
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Smith, Danielle E.
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Noori, Yasir
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Abdelazim, Nema
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Hector, Andrew L.
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De Groot, Kees
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Levason, William
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Bartlett, Philip N.
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Reid, Gillian
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Thomas, Shibin
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Greenacre, Victoria
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Smith, Danielle E.
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Noori, Yasir
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Abdelazim, Nema
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Hector, Andrew L.
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De Groot, Kees
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Levason, William
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Bartlett, Philip N.
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Reid, Gillian
37d35b11-40ce-48c5-a68e-f6ce04cd4037

Thomas, Shibin, Greenacre, Victoria, Smith, Danielle E., Noori, Yasir, Abdelazim, Nema, Hector, Andrew L., De Groot, Kees, Levason, William, Bartlett, Philip N. and Reid, Gillian (2021) Tungsten disulfide thin films via electrodeposition from a single source precursor. ChemComm, 57 (79), 10194-10197. (doi:10.1039/D1CC03297F).

Record type: Article

Abstract

We report a simple process for the electrodeposition of tungsten disulfide thin films from a CH2Cl2-based electrolyte using a tailored single source precursor, [NEt4]2[WS2Cl4]. This new precursor incorporates the 1:2 W:S ratio required for formation of WS2, and eliminates the need for an additional proton source in the electrolyte to remove excess sulfide. The electrochemical behaviour of [NEt4]2[WS2Cl4] is studied by cyclic voltammetry and electrochemical quartz crystal microbalance techniques, and the WS2 thin films are grown by potentiostatic electrodeposition.

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Published date: 5 October 2021
Additional Information: Funding Information: We thank the EPSRC for funding via EP/P025137/1, EP/ N509747/1, and the ADEPT programme grant (EP/N035437/1).

Identifiers

Local EPrints ID: 451744
URI: http://eprints.soton.ac.uk/id/eprint/451744
ISSN: 1359-7345
PURE UUID: c966f323-4d4a-4815-839c-089c68a9685e
ORCID for Shibin Thomas: ORCID iD orcid.org/0000-0002-7735-788X
ORCID for Victoria Greenacre: ORCID iD orcid.org/0000-0002-3381-9616
ORCID for Danielle E. Smith: ORCID iD orcid.org/0000-0002-2446-1763
ORCID for Yasir Noori: ORCID iD orcid.org/0000-0001-5285-8779
ORCID for Andrew L. Hector: ORCID iD orcid.org/0000-0002-9964-2163
ORCID for Kees De Groot: ORCID iD orcid.org/0000-0002-3850-7101
ORCID for William Levason: ORCID iD orcid.org/0000-0003-3540-0971
ORCID for Philip N. Bartlett: ORCID iD orcid.org/0000-0002-7300-6900
ORCID for Gillian Reid: ORCID iD orcid.org/0000-0001-5349-3468

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Date deposited: 25 Oct 2021 16:30
Last modified: 17 Mar 2024 04:03

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Contributors

Author: Shibin Thomas ORCID iD
Author: Victoria Greenacre ORCID iD
Author: Danielle E. Smith ORCID iD
Author: Yasir Noori ORCID iD
Author: Nema Abdelazim
Author: Kees De Groot ORCID iD
Author: William Levason ORCID iD
Author: Gillian Reid ORCID iD

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