Solvent vapor annealing of block copolymers in confined topographies: Commensurability considerations for nanolithography
Solvent vapor annealing of block copolymers in confined topographies: Commensurability considerations for nanolithography
The directed self-assembly of block copolymer (BCP) materials in topographically patterned substrates (i.e., graphoepitaxy) is a potential methodology for the continued scaling of nanoelectronic device technologies. In this Communication, an unusual feature size variation in BCP nanodomains under confinement with graphoepitaxially aligned cylinder-forming poly(styrene)-block-poly(4-vinylpyridine) (PS-b-P4VP) BCP is reported. Graphoepitaxy of PS-b-P4VP BCP line patterns (CII) is accomplished via topography in hydrogen silsequioxane (HSQ) modified substrates and solvent vapor annealing (SVA). Interestingly, reduced domain sizes in features close to the HSQ guiding features are observed. The feature size reduction is evident after inclusion of alumina into the P4VP domains followed by pattern transfer to the silicon substrate. It is suggested that this nanodomain size perturbation is due to solvent swelling effects during SVA. It is proposed that using a commensurability value close to the solvent vapor annealed periodicity will alleviate this issue leading to uniform nanofins. An unusual nanodomain size variation is observed following the solvent vapor annealed graphoepitaxial alignment of a cylinder forming poly(styrene)-block-poly(4-vinylpyridine) (PS-b-P4VP) block copolymer. Reduced silicon nanofin feature sizes are evident at sidewalls after pattern transfer of alumina impregnated P4VP domains acting as a hardmask. A larger commensurability strategy is suggested to circumvent varying nanodomain sizes after solvent treatment.
block copolymers, commensurability, directed self-assembly, graphoepitaxy, pattern transfer, solvent vapor annealing
762-767
Cummins, Cian
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Kelly, Roisin A.
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Gangnaik, Anushka
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Georgiev, Yordan M.
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Petkov, Nikolay
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Holmes, Justin D.
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Morris, Michael A.
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1 April 2015
Cummins, Cian
e5296968-38f7-4cc8-8ddd-527af2b29faf
Kelly, Roisin A.
8c78bd73-66c9-4ecb-9d14-d4f6eb008055
Gangnaik, Anushka
8b44e462-2a3f-4295-a9ff-1a2f7c09f14d
Georgiev, Yordan M.
75581277-0154-4144-8a94-36eaffeeef02
Petkov, Nikolay
4243e25a-7819-4fa7-afb4-30a86d8b96be
Holmes, Justin D.
6f16ad07-0c95-4eba-a71b-70dd149f5a9a
Morris, Michael A.
7c5bd3d2-1764-496e-b556-6b920a036096
Cummins, Cian, Kelly, Roisin A., Gangnaik, Anushka, Georgiev, Yordan M., Petkov, Nikolay, Holmes, Justin D. and Morris, Michael A.
(2015)
Solvent vapor annealing of block copolymers in confined topographies: Commensurability considerations for nanolithography.
Macromolecular Rapid Communications, 36 (8), .
(doi:10.1002/marc.201400722).
Abstract
The directed self-assembly of block copolymer (BCP) materials in topographically patterned substrates (i.e., graphoepitaxy) is a potential methodology for the continued scaling of nanoelectronic device technologies. In this Communication, an unusual feature size variation in BCP nanodomains under confinement with graphoepitaxially aligned cylinder-forming poly(styrene)-block-poly(4-vinylpyridine) (PS-b-P4VP) BCP is reported. Graphoepitaxy of PS-b-P4VP BCP line patterns (CII) is accomplished via topography in hydrogen silsequioxane (HSQ) modified substrates and solvent vapor annealing (SVA). Interestingly, reduced domain sizes in features close to the HSQ guiding features are observed. The feature size reduction is evident after inclusion of alumina into the P4VP domains followed by pattern transfer to the silicon substrate. It is suggested that this nanodomain size perturbation is due to solvent swelling effects during SVA. It is proposed that using a commensurability value close to the solvent vapor annealed periodicity will alleviate this issue leading to uniform nanofins. An unusual nanodomain size variation is observed following the solvent vapor annealed graphoepitaxial alignment of a cylinder forming poly(styrene)-block-poly(4-vinylpyridine) (PS-b-P4VP) block copolymer. Reduced silicon nanofin feature sizes are evident at sidewalls after pattern transfer of alumina impregnated P4VP domains acting as a hardmask. A larger commensurability strategy is suggested to circumvent varying nanodomain sizes after solvent treatment.
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e-pub ahead of print date: 19 February 2015
Published date: 1 April 2015
Keywords:
block copolymers, commensurability, directed self-assembly, graphoepitaxy, pattern transfer, solvent vapor annealing
Identifiers
Local EPrints ID: 452530
URI: http://eprints.soton.ac.uk/id/eprint/452530
ISSN: 1022-1336
PURE UUID: 95c9df26-a7e6-4970-8bc8-e8b1f6a28002
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Date deposited: 11 Dec 2021 11:26
Last modified: 16 Mar 2024 14:31
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Contributors
Author:
Cian Cummins
Author:
Roisin A. Kelly
Author:
Anushka Gangnaik
Author:
Yordan M. Georgiev
Author:
Nikolay Petkov
Author:
Justin D. Holmes
Author:
Michael A. Morris
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