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Thick BaTiO3 epitaxial films integrated on Si by RF sputtering for electro-optic modulators in Si photonics

Thick BaTiO3 epitaxial films integrated on Si by RF sputtering for electro-optic modulators in Si photonics
Thick BaTiO3 epitaxial films integrated on Si by RF sputtering for electro-optic modulators in Si photonics
Thick epitaxial BaTiO3 films ranging from 120 nm to 1 μm were grown by off-axis RF magnetron sputtering on SrTiO3-templated silicon-on-insulator (SOI) substrates for use in electro-optic applications, where such large thicknesses are necessary. The films are of high quality, rivaling those grown by molecular beam epitaxy (MBE) in crystalline quality, but can be grown 10 times faster. Extraction of lattice parameters from geometric phase analysis of atomic-resolution scanning transmission electron microscopy images revealed how the in-plane and out-of-plane lattice spacings of sputtered BaTiO3 changes as a function of layer position within a thick film. Our results indicate that compared to molecular beam epitaxy, sputtered films retain their out-of-plane polarization (c-axis) orientation for larger thicknesses. We also find an unusual re-transition from in-plane polarization (a-axis) to out-of-plane polarization (c-axis), along with an anomalous lattice expansion, near the surface. We also studied a method of achieving 100% a-axis-oriented films using a two-step process involving amorphous growth and recrystallization of a seed layer followed by normal high temperature growth. While this method is successful in achieving full a-axis orientation even at low thicknesses, the resulting film has a large number of voids and misoriented grains. Electro-optic measurement using a transmission setup of a sputtered BTO film grown using the optimized conditions yields an effective Pockels coefficient as high as 183 pm/V. A Mach–Zehnder modulator fabricated on such films exhibits phase shifting with an equivalent Pockels coefficient of 157 pm/V. These results demonstrate that sputtered BTO thick films can be used for integrated electro-optic modulators for Si photonics.
1944-8244
51230–51244
Cao, Wei
5202fa2b-a471-45d4-84e9-9104dffdbbfc
Reynolds, Jamie Dean
96faa744-02ee-458c-8e48-953ea9e54afe
Jeyaselvan, Vadivukkarasi
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Mashanovich, Goran
c806e262-af80-4836-b96f-319425060051
Posadas, Agham B.
4d382ac6-35f5-4dc0-8ae6-426acf942034
Park, Hyoju
4fd6e82a-da4b-43c9-8821-c419c4130675
Reynaud, Marc
d3a05830-36c4-4201-97ce-8fc2041d481c
Guo, Wei
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Beskini, Ilya
e1a09010-765b-4c51-8736-d86aa0ce04a8
Warner, Jamie H.
c1d9dbc5-e34e-437d-8e65-10289263bf48
Demkov, Alexander A.
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Cao, Wei
5202fa2b-a471-45d4-84e9-9104dffdbbfc
Reynolds, Jamie Dean
96faa744-02ee-458c-8e48-953ea9e54afe
Jeyaselvan, Vadivukkarasi
77fc6f3f-1658-42ca-8a2c-26998e27e8b1
Mashanovich, Goran
c806e262-af80-4836-b96f-319425060051
Posadas, Agham B.
4d382ac6-35f5-4dc0-8ae6-426acf942034
Park, Hyoju
4fd6e82a-da4b-43c9-8821-c419c4130675
Reynaud, Marc
d3a05830-36c4-4201-97ce-8fc2041d481c
Guo, Wei
523e9ed7-4d79-46fd-84d4-953c3d0ba934
Beskini, Ilya
e1a09010-765b-4c51-8736-d86aa0ce04a8
Warner, Jamie H.
c1d9dbc5-e34e-437d-8e65-10289263bf48
Demkov, Alexander A.
883634db-e276-4df3-9400-3d089dbab699

Cao, Wei, Reynolds, Jamie Dean, Jeyaselvan, Vadivukkarasi, Mashanovich, Goran, Posadas, Agham B., Park, Hyoju, Reynaud, Marc, Guo, Wei, Beskini, Ilya, Warner, Jamie H. and Demkov, Alexander A. (2021) Thick BaTiO3 epitaxial films integrated on Si by RF sputtering for electro-optic modulators in Si photonics. ACS Applied Materials and Interfaces, 13 (43), 51230–51244. (doi:10.1021/acsami.1c14048).

Record type: Article

Abstract

Thick epitaxial BaTiO3 films ranging from 120 nm to 1 μm were grown by off-axis RF magnetron sputtering on SrTiO3-templated silicon-on-insulator (SOI) substrates for use in electro-optic applications, where such large thicknesses are necessary. The films are of high quality, rivaling those grown by molecular beam epitaxy (MBE) in crystalline quality, but can be grown 10 times faster. Extraction of lattice parameters from geometric phase analysis of atomic-resolution scanning transmission electron microscopy images revealed how the in-plane and out-of-plane lattice spacings of sputtered BaTiO3 changes as a function of layer position within a thick film. Our results indicate that compared to molecular beam epitaxy, sputtered films retain their out-of-plane polarization (c-axis) orientation for larger thicknesses. We also find an unusual re-transition from in-plane polarization (a-axis) to out-of-plane polarization (c-axis), along with an anomalous lattice expansion, near the surface. We also studied a method of achieving 100% a-axis-oriented films using a two-step process involving amorphous growth and recrystallization of a seed layer followed by normal high temperature growth. While this method is successful in achieving full a-axis orientation even at low thicknesses, the resulting film has a large number of voids and misoriented grains. Electro-optic measurement using a transmission setup of a sputtered BTO film grown using the optimized conditions yields an effective Pockels coefficient as high as 183 pm/V. A Mach–Zehnder modulator fabricated on such films exhibits phase shifting with an equivalent Pockels coefficient of 157 pm/V. These results demonstrate that sputtered BTO thick films can be used for integrated electro-optic modulators for Si photonics.

Text
Thick BaTiO3 Epitaxial Films Integrated on Si by RF Sputtering for Electro-Optic Modulators in Si Photonics-Primary Manuscript - Accepted Manuscript
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Accepted/In Press date: 1 October 2021
e-pub ahead of print date: 20 October 2021

Identifiers

Local EPrints ID: 453873
URI: http://eprints.soton.ac.uk/id/eprint/453873
ISSN: 1944-8244
PURE UUID: e8c9ec18-e708-4ffe-b063-11e91cd04980
ORCID for Wei Cao: ORCID iD orcid.org/0000-0003-1431-7060
ORCID for Jamie Dean Reynolds: ORCID iD orcid.org/0000-0002-0072-0134
ORCID for Goran Mashanovich: ORCID iD orcid.org/0000-0003-2954-5138

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Date deposited: 25 Jan 2022 17:42
Last modified: 21 Nov 2024 05:02

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Contributors

Author: Wei Cao ORCID iD
Author: Jamie Dean Reynolds ORCID iD
Author: Vadivukkarasi Jeyaselvan
Author: Goran Mashanovich ORCID iD
Author: Agham B. Posadas
Author: Hyoju Park
Author: Marc Reynaud
Author: Wei Guo
Author: Ilya Beskini
Author: Jamie H. Warner
Author: Alexander A. Demkov

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