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A fullerene-platinum complex for direct functional patterning of single metal atom-embedded carbon nanostructures

A fullerene-platinum complex for direct functional patterning of single metal atom-embedded carbon nanostructures
A fullerene-platinum complex for direct functional patterning of single metal atom-embedded carbon nanostructures
The development of patterning materials (“resists”) at the nanoscale involves two distinct trends: one is toward high sensitivity and resolution for miniaturization, the other aims at functionalization of the resists to realize bottom-up construction of distinct nanoarchitectures. Patterning of carbon nanostructures, a seemingly ideal application for organic functional resists, has been highly reliant on complicated pattern transfer processes because of a lack of patternable precursors. Herein, we present a fullerene–metal coordination complex as a fabrication material for direct functional patterning of sub-10 nm metal-containing carbon structures. The attachment of one platinum atom per fullerene molecule not only leads to significant improvement of sensitivity and resolution but also enables stable atomic dispersion of the platinum ions within the carbon matrix, which may gain fundamentally new interest in functional patterning of hierarchical carbon nanostructures.
1948-7185
1578–1586
Shi, Xiaoqing
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Boden, Stuart
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Yang, Dongxu
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Chen, Xiangyi
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He, Dongsheng
cb353987-c546-4402-8aef-a5bd2b156fbe
Frommhold, Andreas
e31ede47-1366-408c-84cd-08291c5e9e54
Lebedeva, Maria A.
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V. Ershova, Olga
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Palmer, Richard E.
42e6ffd2-b0fb-4574-9400-b3f06a7117a6
Li, Ziyou
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Shi, Haofei
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Gao, Jianzhi
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Pan, Minghu
be1f9f0e-b415-4865-bb35-543f7673033b
Khlobystov, Andrei N.
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Chamberlain, Thomas
d3e126ac-a15e-4724-aaa4-1dc66bf8b352
Robinson, Alex P.G.
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Shi, Xiaoqing
004139e0-0381-40c5-a407-ea9865fd3c7a
Boden, Stuart
83976b65-e90f-42d1-9a01-fe9cfc571bf8
Yang, Dongxu
9868a69f-a177-4437-a013-b334f49a8431
Chen, Xiangyi
910b0f6d-c3f4-433c-bb2b-b58304a1e799
He, Dongsheng
cb353987-c546-4402-8aef-a5bd2b156fbe
Frommhold, Andreas
e31ede47-1366-408c-84cd-08291c5e9e54
Lebedeva, Maria A.
c1b1333a-a23b-4650-945b-da2153b2c701
V. Ershova, Olga
21042677-ff76-464d-8973-344eaba15123
Palmer, Richard E.
42e6ffd2-b0fb-4574-9400-b3f06a7117a6
Li, Ziyou
841b1238-8d15-448c-ac22-4428659df84f
Shi, Haofei
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Gao, Jianzhi
0ce1bcbc-a3fe-46a2-8603-36ca647f0be9
Pan, Minghu
be1f9f0e-b415-4865-bb35-543f7673033b
Khlobystov, Andrei N.
27b2c834-ce18-4106-9cbe-17e2968551a4
Chamberlain, Thomas
d3e126ac-a15e-4724-aaa4-1dc66bf8b352
Robinson, Alex P.G.
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Shi, Xiaoqing, Boden, Stuart, Yang, Dongxu, Chen, Xiangyi, He, Dongsheng, Frommhold, Andreas, Lebedeva, Maria A., V. Ershova, Olga, Palmer, Richard E., Li, Ziyou, Shi, Haofei, Gao, Jianzhi, Pan, Minghu, Khlobystov, Andrei N., Chamberlain, Thomas and Robinson, Alex P.G. (2022) A fullerene-platinum complex for direct functional patterning of single metal atom-embedded carbon nanostructures. Journal of Physical Chemistry Letters, 13 (6), 1578–1586. (doi:10.1021/acs.jpclett.1c03877).

Record type: Article

Abstract

The development of patterning materials (“resists”) at the nanoscale involves two distinct trends: one is toward high sensitivity and resolution for miniaturization, the other aims at functionalization of the resists to realize bottom-up construction of distinct nanoarchitectures. Patterning of carbon nanostructures, a seemingly ideal application for organic functional resists, has been highly reliant on complicated pattern transfer processes because of a lack of patternable precursors. Herein, we present a fullerene–metal coordination complex as a fabrication material for direct functional patterning of sub-10 nm metal-containing carbon structures. The attachment of one platinum atom per fullerene molecule not only leads to significant improvement of sensitivity and resolution but also enables stable atomic dispersion of the platinum ions within the carbon matrix, which may gain fundamentally new interest in functional patterning of hierarchical carbon nanostructures.

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Accepted/In Press date: 25 January 2022
e-pub ahead of print date: 9 February 2022
Published date: 17 February 2022
Additional Information: Funding Information: This work is dedicated to the memory of our coauthor Dr. Ziyou Li, a fine scientist and a good friend, who sadly passed away shortly before this paper was submitted. The authors acknowledge support from the Engineering and Physical Sciences Research Council and the European Research Council. The STEM instrument, Oxford Instruments PlasmaPro NGP80 Inductively Coupled Plasma etching system, and Disco DAD 321 wafer dicer used in this research were obtained through Birmingham Science City: Creating and Characterizing Next Generation Advanced Materials, with support from Advantage West Midlands and partially funded by the European Regional Development Fund. D.Y. and D.H. thank the University of Birmingham and China Scholarship Council (CSC) for support. Publisher Copyright: © 2022 American Chemical Society

Identifiers

Local EPrints ID: 456582
URI: http://eprints.soton.ac.uk/id/eprint/456582
ISSN: 1948-7185
PURE UUID: de10412a-5c64-41cf-b988-dd687102fd2f
ORCID for Stuart Boden: ORCID iD orcid.org/0000-0002-4232-1828

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Date deposited: 05 May 2022 16:39
Last modified: 16 Jun 2022 01:38

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Contributors

Author: Xiaoqing Shi
Author: Stuart Boden ORCID iD
Author: Dongxu Yang
Author: Xiangyi Chen
Author: Dongsheng He
Author: Andreas Frommhold
Author: Maria A. Lebedeva
Author: Olga V. Ershova
Author: Richard E. Palmer
Author: Ziyou Li
Author: Haofei Shi
Author: Jianzhi Gao
Author: Minghu Pan
Author: Andrei N. Khlobystov
Author: Thomas Chamberlain
Author: Alex P.G. Robinson

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