The effect of boron doping on the diffusion of phosphorus in silicon
The effect of boron doping on the diffusion of phosphorus in silicon
University of Southampton
1971
Drake, William Henry
(1971)
The effect of boron doping on the diffusion of phosphorus in silicon.
University of Southampton, Doctoral Thesis.
Record type:
Thesis
(Doctoral)
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Published date: 1971
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Local EPrints ID: 459002
URI: http://eprints.soton.ac.uk/id/eprint/459002
PURE UUID: f118893e-fa54-4581-a02c-79f8fc28bb0d
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Date deposited: 04 Jul 2022 17:02
Last modified: 04 Jul 2022 17:02
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Author:
William Henry Drake
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