Altrip, John Lawrence (1992) The diffusion and electrical activation of rapid thermally annealed arsenic implanted silicon. University of Southampton, Doctoral Thesis.
Record type:
Thesis
(Doctoral)
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Published date: 1992
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Local EPrints ID: 462082
URI: http://eprints.soton.ac.uk/id/eprint/462082
PURE UUID: b6707e8b-a816-4318-9be8-a4cdd408d5ed
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Date deposited: 04 Jul 2022 19:01
Last modified: 04 Jul 2022 19:01
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Author:
John Lawrence Altrip
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