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Anodic oxide films on titanium electrodes

Anodic oxide films on titanium electrodes
Anodic oxide films on titanium electrodes

In this work the properties of anodic titanium oxide layers have been studied by conventional electrochemical techniques and, by photocurrent spectroscopy. Films grown slowly in 1 11 H 2 SO 4 are shown to have a uniform donor density of 's 3 x 1020 cm-3 and a relative permittivity of 37 - 40. Rapidly grown films have a high density of electron traps, and a spatial distribution of electron donors, which agrees with the predictions of the Dewald theory of anodic film growth. 'The growth law for the formation of TiO2 was investigated and it is shown that there are at least two mobile species involved in oxide growth. Films grown to high formation potentials (> 25 V) are shown to be mechanically unstable and to break down. on removal of the applied field. The onset of film breakdown at lower potentials is manifested by a reduction in the photocurrent, and enhanced nucleation of metals on the film surface. It is concluded that the optimum film thickness for corrosion resistance is 125 - 175 1 (i.e. 5 V - 7 V formation potential).

University of Southampton
McAleer, Jerome Francis
McAleer, Jerome Francis

McAleer, Jerome Francis (1980) Anodic oxide films on titanium electrodes. University of Southampton, Doctoral Thesis.

Record type: Thesis (Doctoral)

Abstract

In this work the properties of anodic titanium oxide layers have been studied by conventional electrochemical techniques and, by photocurrent spectroscopy. Films grown slowly in 1 11 H 2 SO 4 are shown to have a uniform donor density of 's 3 x 1020 cm-3 and a relative permittivity of 37 - 40. Rapidly grown films have a high density of electron traps, and a spatial distribution of electron donors, which agrees with the predictions of the Dewald theory of anodic film growth. 'The growth law for the formation of TiO2 was investigated and it is shown that there are at least two mobile species involved in oxide growth. Films grown to high formation potentials (> 25 V) are shown to be mechanically unstable and to break down. on removal of the applied field. The onset of film breakdown at lower potentials is manifested by a reduction in the photocurrent, and enhanced nucleation of metals on the film surface. It is concluded that the optimum film thickness for corrosion resistance is 125 - 175 1 (i.e. 5 V - 7 V formation potential).

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Published date: 1980

Identifiers

Local EPrints ID: 462701
URI: http://eprints.soton.ac.uk/id/eprint/462701
PURE UUID: 1ba19c8d-eae8-46b4-be32-a32b0b6e6355

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Date deposited: 04 Jul 2022 19:42
Last modified: 04 Jul 2022 19:42

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Contributors

Author: Jerome Francis McAleer

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