Multistep synthesis on SU-8: Combining microfabrication and solid-phase chemistry on a single material
Multistep synthesis on SU-8: Combining microfabrication and solid-phase chemistry on a single material
SU-8 is an epoxy-novolac resin and a well-established negative photoresist for microfabrication and microengineering. The photopolymerized resist is an extremely highly crosslinked polymer showing outstanding chemical and physical robustness with residual surface epoxy groups amenable for chemical functionalization. In this paper we describe, for the first time, the preparation and surface modification of SU-8 particles shaped as microbars, the attachment of appropriate linkers, and the successful application of these particles to multistep solid-phase synthesis leading to oligonucleotides and peptides attached in an unambiguous manner to the support surface.
photoresist, oligonucleotides, immobilization, capillary-electrophoresis, high-aspect-ratio, archip epoxy, mass-spectrometry, peptide-synthesis, protease inhibitors, mems
462-472
Cavalli, Gabriel
37d26614-5388-4c24-b5ad-531715d1ddb7
Banu, Shahanara
5e1caab9-665e-4a17-b582-28a059acdf06
Ranasinghe, Rohan T.
b29fc8b4-2a66-430a-85fa-ff1c9c261f32
Broder, Graham R.
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Martins, Hugo F.P.
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Neylon, Cameron
697f067b-db25-4c41-9618-28f4b74f73aa
Morgan, Hywel
de00d59f-a5a2-48c4-a99a-1d5dd7854174
Bradley, Mark
562b9add-34c4-4620-bfa1-c7c83a0f0900
Roach, Peter L.
ca94060c-4443-482b-af3e-979243488ba9
2007
Cavalli, Gabriel
37d26614-5388-4c24-b5ad-531715d1ddb7
Banu, Shahanara
5e1caab9-665e-4a17-b582-28a059acdf06
Ranasinghe, Rohan T.
b29fc8b4-2a66-430a-85fa-ff1c9c261f32
Broder, Graham R.
6e8722f8-020d-4df6-85a1-30f2f5fdf419
Martins, Hugo F.P.
d3c0a265-fcd4-4dc7-bdff-6b3cb5642dd6
Neylon, Cameron
697f067b-db25-4c41-9618-28f4b74f73aa
Morgan, Hywel
de00d59f-a5a2-48c4-a99a-1d5dd7854174
Bradley, Mark
562b9add-34c4-4620-bfa1-c7c83a0f0900
Roach, Peter L.
ca94060c-4443-482b-af3e-979243488ba9
Cavalli, Gabriel, Banu, Shahanara, Ranasinghe, Rohan T., Broder, Graham R., Martins, Hugo F.P., Neylon, Cameron, Morgan, Hywel, Bradley, Mark and Roach, Peter L.
(2007)
Multistep synthesis on SU-8: Combining microfabrication and solid-phase chemistry on a single material.
Journal of Combinatorial Chemistry, 9 (3), .
(doi:10.1021/cc060079p).
Abstract
SU-8 is an epoxy-novolac resin and a well-established negative photoresist for microfabrication and microengineering. The photopolymerized resist is an extremely highly crosslinked polymer showing outstanding chemical and physical robustness with residual surface epoxy groups amenable for chemical functionalization. In this paper we describe, for the first time, the preparation and surface modification of SU-8 particles shaped as microbars, the attachment of appropriate linkers, and the successful application of these particles to multistep solid-phase synthesis leading to oligonucleotides and peptides attached in an unambiguous manner to the support surface.
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More information
Published date: 2007
Keywords:
photoresist, oligonucleotides, immobilization, capillary-electrophoresis, high-aspect-ratio, archip epoxy, mass-spectrometry, peptide-synthesis, protease inhibitors, mems
Organisations:
Chemistry
Identifiers
Local EPrints ID: 46382
URI: http://eprints.soton.ac.uk/id/eprint/46382
ISSN: 1520-4766
PURE UUID: 2d4b5a16-96ae-4703-8c73-c4a9e469361a
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Date deposited: 27 Jun 2007
Last modified: 16 Mar 2024 03:36
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Contributors
Author:
Gabriel Cavalli
Author:
Shahanara Banu
Author:
Rohan T. Ranasinghe
Author:
Graham R. Broder
Author:
Hugo F.P. Martins
Author:
Cameron Neylon
Author:
Hywel Morgan
Author:
Mark Bradley
Author:
Peter L. Roach
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