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Multistep synthesis on SU-8: Combining microfabrication and solid-phase chemistry on a single material

Record type: Article

SU-8 is an epoxy-novolac resin and a well-established negative photoresist for microfabrication and microengineering. The photopolymerized resist is an extremely highly crosslinked polymer showing outstanding chemical and physical robustness with residual surface epoxy groups amenable for chemical functionalization. In this paper we describe, for the first time, the preparation and surface modification of SU-8 particles shaped as microbars, the attachment of appropriate linkers, and the successful application of these particles to multistep solid-phase synthesis leading to oligonucleotides and peptides attached in an unambiguous manner to the support surface.

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Citation

Cavalli, Gabriel, Banu, Shahanara, Ranasinghe, Rohan T., Broder, Graham R., Martins, Hugo F.P., Neylon, Cameron, Morgan, Hywel, Bradley, Mark and Roach, Peter L. (2007) Multistep synthesis on SU-8: Combining microfabrication and solid-phase chemistry on a single material Journal of Combinatorial Chemistry, 9, (3), pp. 462-472. (doi:10.1021/cc060079p).

More information

Published date: 2007
Keywords: photoresist, oligonucleotides, immobilization, capillary-electrophoresis, high-aspect-ratio, archip epoxy, mass-spectrometry, peptide-synthesis, protease inhibitors, mems
Organisations: Chemistry

Identifiers

Local EPrints ID: 46382
URI: http://eprints.soton.ac.uk/id/eprint/46382
ISSN: 1520-4766
PURE UUID: 2d4b5a16-96ae-4703-8c73-c4a9e469361a
ORCID for Hywel Morgan: ORCID iD orcid.org/0000-0003-4850-5676

Catalogue record

Date deposited: 27 Jun 2007
Last modified: 17 Jul 2017 15:07

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Contributors

Author: Gabriel Cavalli
Author: Shahanara Banu
Author: Rohan T. Ranasinghe
Author: Graham R. Broder
Author: Hugo F.P. Martins
Author: Cameron Neylon
Author: Hywel Morgan ORCID iD
Author: Mark Bradley
Author: Peter L. Roach

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