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Vertical growth models for analysing vanadium dioxide phase transition in thin films

Vertical growth models for analysing vanadium dioxide phase transition in thin films
Vertical growth models for analysing vanadium dioxide phase transition in thin films
Vanadium dioxide (VO2) possesses a metal-insulator phase transition at ~68 °C that is widely explored for nanophotonic and nanoelectronic applications, such as neuromorphic computing and metasurface-based beam steering. In many of these applications, a key challenge is to accurately model the permittivity of VO2 during the phase transition. In this work, we propose vertical growth models for this purpose, and show that they outperform the traditional effective medium models in analysing thin film.
Zheng, Zihang
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Sun, Kai
b7c648a3-7be8-4613-9d4d-1bf937fb487b
Du, Yuxin
c7d40636-5d75-47cf-bf22-f60d42484c3e
Muskens, Otto
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De Groot, Kees
92cd2e02-fcc4-43da-8816-c86f966be90c
Fang, Xu
96b4b212-496b-4d68-82a4-06df70f94a86
Zheng, Zihang
e6e6d348-ff52-4505-b20c-8ab947456061
Sun, Kai
b7c648a3-7be8-4613-9d4d-1bf937fb487b
Du, Yuxin
c7d40636-5d75-47cf-bf22-f60d42484c3e
Muskens, Otto
2284101a-f9ef-4d79-8951-a6cda5bfc7f9
De Groot, Kees
92cd2e02-fcc4-43da-8816-c86f966be90c
Fang, Xu
96b4b212-496b-4d68-82a4-06df70f94a86

Zheng, Zihang, Sun, Kai, Du, Yuxin, Muskens, Otto, De Groot, Kees and Fang, Xu (2022) Vertical growth models for analysing vanadium dioxide phase transition in thin films. IOP Photon 2022, East Midlands Conference Centre, Nottingham, United Kingdom. 30 Aug - 02 Sep 2022. (In Press)

Record type: Conference or Workshop Item (Paper)

Abstract

Vanadium dioxide (VO2) possesses a metal-insulator phase transition at ~68 °C that is widely explored for nanophotonic and nanoelectronic applications, such as neuromorphic computing and metasurface-based beam steering. In many of these applications, a key challenge is to accurately model the permittivity of VO2 during the phase transition. In this work, we propose vertical growth models for this purpose, and show that they outperform the traditional effective medium models in analysing thin film.

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Photon2022_VO2_XF - Accepted Manuscript
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More information

Accepted/In Press date: 15 June 2022
Venue - Dates: IOP Photon 2022, East Midlands Conference Centre, Nottingham, United Kingdom, 2022-08-30 - 2022-09-02

Identifiers

Local EPrints ID: 467513
URI: http://eprints.soton.ac.uk/id/eprint/467513
PURE UUID: 864d51b4-ca56-44c2-97ef-7ca8862365ee
ORCID for Kai Sun: ORCID iD orcid.org/0000-0001-6807-6253
ORCID for Otto Muskens: ORCID iD orcid.org/0000-0003-0693-5504
ORCID for Kees De Groot: ORCID iD orcid.org/0000-0002-3850-7101
ORCID for Xu Fang: ORCID iD orcid.org/0000-0003-1735-2654

Catalogue record

Date deposited: 12 Jul 2022 16:34
Last modified: 15 Jun 2024 01:42

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Contributors

Author: Zihang Zheng
Author: Kai Sun ORCID iD
Author: Yuxin Du
Author: Otto Muskens ORCID iD
Author: Kees De Groot ORCID iD
Author: Xu Fang ORCID iD

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