Wafer-Scale 200 mm Metal Oxide Infrared Metasurface with Tailored Differential Emissivity Response in the Atmospheric Windows
Wafer-Scale 200 mm Metal Oxide Infrared Metasurface with Tailored Differential Emissivity Response in the Atmospheric Windows
Metasurfaces with sub-wavelength nanoscale features have emerged as a platform to achieve desirable electromagnetic responses. However, it remains technically challenging to fabricate metasurfaces in large size and at low cost for mass production. This work demonstrates a 200 mm wafer-scale Al:ZnO metasurface coating based on deep-UV lithography. The metasurfaces are targeted to achieve infrared (IR) reflectivity and emissivity characteristics at bandwidths across the two atmospheric windows in the IR spectrum. The wafers demonstrate a high uniformity of optical response with tailored reflectivity of around 50% at the 3–5 µm mid-wave IR band and less than 10% at the 8–13 µm long-wave IR band. This article furthermore shows that the design principle allows achieving a wide range of dual-band reflectivity values using a single underlying materials stack, offering a versatile platform. The proposed approach is compatible with CMOS-compatible mass-production manufacturing and brings IR metasurface coatings closer to commercially relevant and scalable technology.
electro-optical devices, emittance control, infrared materials, metasurfaces, plasmonics
Sun, Kai
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Vassos, Evangelos
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Yan, Xingzhao
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Wheeler, Callum
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Churm, James
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Wiecha, Peter R.
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Gregory, Simon A.
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Feresidis, Alex
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de Groot, Cornelis H.
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Muskens, Otto L.
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5 September 2022
Sun, Kai
b7c648a3-7be8-4613-9d4d-1bf937fb487b
Vassos, Evangelos
01a51227-65e2-4705-b880-6f5800f6c516
Yan, Xingzhao
e1f3f636-74e4-42d5-81c7-04feec2b85ba
Wheeler, Callum
0e02ee8f-8629-4169-9a53-64e0b905de05
Churm, James
7bf3fe1f-6c68-414d-83c4-ddce7f68b643
Wiecha, Peter R.
fb335482-9577-41af-a0ef-3988b7654c9b
Gregory, Simon A.
0fa9aa39-f4bd-4a5e-9429-46fc462d6554
Feresidis, Alex
b9b89064-cb2e-4948-ac2a-2661333da11f
de Groot, Cornelis H.
92cd2e02-fcc4-43da-8816-c86f966be90c
Muskens, Otto L.
2284101a-f9ef-4d79-8951-a6cda5bfc7f9
Sun, Kai, Vassos, Evangelos, Yan, Xingzhao, Wheeler, Callum, Churm, James, Wiecha, Peter R., Gregory, Simon A., Feresidis, Alex, de Groot, Cornelis H. and Muskens, Otto L.
(2022)
Wafer-Scale 200 mm Metal Oxide Infrared Metasurface with Tailored Differential Emissivity Response in the Atmospheric Windows.
Advanced Optical Materials, 10 (17), [2200452].
(doi:10.1002/adom.202200452).
Abstract
Metasurfaces with sub-wavelength nanoscale features have emerged as a platform to achieve desirable electromagnetic responses. However, it remains technically challenging to fabricate metasurfaces in large size and at low cost for mass production. This work demonstrates a 200 mm wafer-scale Al:ZnO metasurface coating based on deep-UV lithography. The metasurfaces are targeted to achieve infrared (IR) reflectivity and emissivity characteristics at bandwidths across the two atmospheric windows in the IR spectrum. The wafers demonstrate a high uniformity of optical response with tailored reflectivity of around 50% at the 3–5 µm mid-wave IR band and less than 10% at the 8–13 µm long-wave IR band. This article furthermore shows that the design principle allows achieving a wide range of dual-band reflectivity values using a single underlying materials stack, offering a versatile platform. The proposed approach is compatible with CMOS-compatible mass-production manufacturing and brings IR metasurface coatings closer to commercially relevant and scalable technology.
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More information
Accepted/In Press date: 2022
e-pub ahead of print date: 19 June 2022
Published date: 5 September 2022
Additional Information:
Funding Information:
The authors acknowledge the funding from DASA/Dstl under Grant Award No. ACC6011239. O.L.M. acknowledges the support from EPSRC grant EP/M009122/1. The authors acknowledge Malvern Optical Ltd for its support with Directional hemispherical reflectance (DHR) measurements and useful discussions with Dr. Peter Raven from Malvern Optical Ltd. The authors thank the Southampton “Cornerstone” wafer‐scale processing facility for its expertise in DUV lithography.
Funding Information:
The authors acknowledge the funding from DASA/Dstl under Grant Award No. ACC6011239. O.L.M. acknowledges the support from EPSRC grant EP/M009122/1. The authors acknowledge Malvern Optical Ltd for its support with Directional hemispherical reflectance (DHR) measurements and useful discussions with Dr. Peter Raven from Malvern Optical Ltd. The authors thank the Southampton “Cornerstone” wafer-scale processing facility for its expertise in DUV lithography.
Publisher Copyright:
© 2022 The Authors. Advanced Optical Materials published by Wiley-VCH GmbH.
Keywords:
electro-optical devices, emittance control, infrared materials, metasurfaces, plasmonics
Identifiers
Local EPrints ID: 468144
URI: http://eprints.soton.ac.uk/id/eprint/468144
ISSN: 2195-1071
PURE UUID: 02ed6fdc-00f0-4d5d-b807-f3e4d130bb76
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Date deposited: 03 Aug 2022 17:28
Last modified: 18 Mar 2024 03:13
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Contributors
Author:
Evangelos Vassos
Author:
Callum Wheeler
Author:
James Churm
Author:
Peter R. Wiecha
Author:
Simon A. Gregory
Author:
Alex Feresidis
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