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Integrated zinc oxide inverters with optimised Al-doped zinc oxide contacts

Integrated zinc oxide inverters with optimised Al-doped zinc oxide contacts
Integrated zinc oxide inverters with optimised Al-doped zinc oxide contacts
Poor source-drain contacts could degrade a metal-oxide channel thin-film transistor’s (TFT) on/off current ratio, reduce the effective mobility and affect integrated circuit operation. To mitigate this issue, conductive oxides such as Al-doped ZnO (AZO) have been used as ohmic contacts [1]. However, there is little work done on the impact of varying Al/Zn doping ratios in AZO on the electrical performance of TFT circuits. Therefore, in this work, we investigate the Al/Zn doping ratio for a ZnO TFT source-drain with low sub-threshold slope, high mobility, and high on/off ratio suitable for circuit applications such as a resistive-load inverter,
Rowlinson, Ben, Daniel
05db0f48-f15f-4d54-93eb-1e310348bc9a
Zeng, Jiale
a76aaa33-5b24-4590-849d-12d8fdd44618
Mallari, Arvin Cedric
4fb67222-9205-472b-aa3d-96eaa7a33115
Akrofi, Joshua, Daniel
5022b800-8f9b-4737-85cf-1690b9b1bd61
Ebert, Martin
1a8f1756-d724-4b44-8504-c01f8dc7aa50
Boodhoo, Liam
4b4e0c7b-bc90-4e49-8e99-36b646bc12c2
Chong, Harold
795aa67f-29e5-480f-b1bc-9bd5c0d558e1
Rowlinson, Ben, Daniel
05db0f48-f15f-4d54-93eb-1e310348bc9a
Zeng, Jiale
a76aaa33-5b24-4590-849d-12d8fdd44618
Mallari, Arvin Cedric
4fb67222-9205-472b-aa3d-96eaa7a33115
Akrofi, Joshua, Daniel
5022b800-8f9b-4737-85cf-1690b9b1bd61
Ebert, Martin
1a8f1756-d724-4b44-8504-c01f8dc7aa50
Boodhoo, Liam
4b4e0c7b-bc90-4e49-8e99-36b646bc12c2
Chong, Harold
795aa67f-29e5-480f-b1bc-9bd5c0d558e1

Rowlinson, Ben, Daniel, Zeng, Jiale, Mallari, Arvin Cedric, Akrofi, Joshua, Daniel, Ebert, Martin, Boodhoo, Liam and Chong, Harold (2022) Integrated zinc oxide inverters with optimised Al-doped zinc oxide contacts. 48th Internaltional Conference on Micro and Nano Engineering - EuroSensor, , Leuven, Belgium. 19 - 23 Sep 2022. (In Press)

Record type: Conference or Workshop Item (Other)

Abstract

Poor source-drain contacts could degrade a metal-oxide channel thin-film transistor’s (TFT) on/off current ratio, reduce the effective mobility and affect integrated circuit operation. To mitigate this issue, conductive oxides such as Al-doped ZnO (AZO) have been used as ohmic contacts [1]. However, there is little work done on the impact of varying Al/Zn doping ratios in AZO on the electrical performance of TFT circuits. Therefore, in this work, we investigate the Al/Zn doping ratio for a ZnO TFT source-drain with low sub-threshold slope, high mobility, and high on/off ratio suitable for circuit applications such as a resistive-load inverter,

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More information

Accepted/In Press date: 8 June 2022
Venue - Dates: 48th Internaltional Conference on Micro and Nano Engineering - EuroSensor, , Leuven, Belgium, 2022-09-19 - 2022-09-23

Identifiers

Local EPrints ID: 470524
URI: http://eprints.soton.ac.uk/id/eprint/470524
PURE UUID: 6dc2745c-81da-4925-a77c-f37dbe402977
ORCID for Ben, Daniel Rowlinson: ORCID iD orcid.org/0000-0002-7533-0579
ORCID for Jiale Zeng: ORCID iD orcid.org/0000-0001-8828-675X
ORCID for Harold Chong: ORCID iD orcid.org/0000-0002-7110-5761

Catalogue record

Date deposited: 22 Jan 2025 17:44
Last modified: 10 Jun 2025 02:06

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Contributors

Author: Ben, Daniel Rowlinson ORCID iD
Author: Jiale Zeng ORCID iD
Author: Arvin Cedric Mallari
Author: Joshua, Daniel Akrofi
Author: Martin Ebert
Author: Liam Boodhoo
Author: Harold Chong ORCID iD

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