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Tunable index silicon nitride for CMOS photonics applications

Tunable index silicon nitride for CMOS photonics applications
Tunable index silicon nitride for CMOS photonics applications
We are demonstrating the use of Low temperature PECVD silicon nitride based materials used for applications ranging from non-linear functionalities in the C band, wavelength division multiplexing in the O band and post fabrication light based refractive index tuning for in-situ device trimming. These materials are demonstrated for waveguide ranging from 300 nm up to 1 micron in thickness with refractive indices varying between 1.9 and 2.55.
1996-756X
SPIE
Gardes, Frederic Y.
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Domínguez Bucio, Thalía
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Mastronardi, Lorenzo
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De Paoli, Greta
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Jantzen, Senta L.
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Skandalos, Ilias
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Milošević, Milan M.
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Vitali, Valerio
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Faneca, Joaquin
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Petropoulos, Periklis
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Jurado Romero, Francisco
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Luque-González, José Manuel
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Molina-Fernández, Íñigo
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Halir, Robert
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Ortega-Moñux, Alejandro
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Wangüemert-Pérez, J. G.
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Melati, Daniele
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Schmid, Jens H.
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Cheben, Pavel
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García-Blanco, Sonia M.
Cheben, Pavel
Gardes, Frederic Y.
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Domínguez Bucio, Thalía
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Mastronardi, Lorenzo
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De Paoli, Greta
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Jantzen, Senta L.
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Skandalos, Ilias
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Milošević, Milan M.
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Vitali, Valerio
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Faneca, Joaquin
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Petropoulos, Periklis
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Jurado Romero, Francisco
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Luque-González, José Manuel
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Molina-Fernández, Íñigo
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Halir, Robert
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Ortega-Moñux, Alejandro
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Wangüemert-Pérez, J. G.
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Melati, Daniele
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Schmid, Jens H.
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Cheben, Pavel
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García-Blanco, Sonia M.
Cheben, Pavel

Gardes, Frederic Y., Domínguez Bucio, Thalía, Mastronardi, Lorenzo, De Paoli, Greta, Jantzen, Senta L., Skandalos, Ilias, Milošević, Milan M., Vitali, Valerio, Faneca, Joaquin, Petropoulos, Periklis, Jurado Romero, Francisco, Luque-González, José Manuel, Molina-Fernández, Íñigo, Halir, Robert, Ortega-Moñux, Alejandro, Wangüemert-Pérez, J. G., Melati, Daniele, Schmid, Jens H. and Cheben, Pavel (2021) Tunable index silicon nitride for CMOS photonics applications. García-Blanco, Sonia M. and Cheben, Pavel (eds.) In Integrated Optics: Devices, Materials, and Technologies XXV. vol. 11689, SPIE.. (doi:10.1117/12.2578387).

Record type: Conference or Workshop Item (Paper)

Abstract

We are demonstrating the use of Low temperature PECVD silicon nitride based materials used for applications ranging from non-linear functionalities in the C band, wavelength division multiplexing in the O band and post fabrication light based refractive index tuning for in-situ device trimming. These materials are demonstrated for waveguide ranging from 300 nm up to 1 micron in thickness with refractive indices varying between 1.9 and 2.55.

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More information

e-pub ahead of print date: 5 March 2021

Identifiers

Local EPrints ID: 470672
URI: http://eprints.soton.ac.uk/id/eprint/470672
ISSN: 1996-756X
PURE UUID: 673612a3-4511-453d-bc41-c6a205f43ab4
ORCID for Frederic Y. Gardes: ORCID iD orcid.org/0000-0003-1400-3272
ORCID for Thalía Domínguez Bucio: ORCID iD orcid.org/0000-0002-3664-1403
ORCID for Lorenzo Mastronardi: ORCID iD orcid.org/0000-0003-1489-2778
ORCID for Senta L. Jantzen: ORCID iD orcid.org/0000-0003-2646-7293
ORCID for Ilias Skandalos: ORCID iD orcid.org/0000-0002-9021-1420
ORCID for Periklis Petropoulos: ORCID iD orcid.org/0000-0002-1576-8034

Catalogue record

Date deposited: 17 Oct 2022 16:59
Last modified: 09 Oct 2024 02:12

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Contributors

Author: Frederic Y. Gardes ORCID iD
Author: Thalía Domínguez Bucio ORCID iD
Author: Lorenzo Mastronardi ORCID iD
Author: Greta De Paoli
Author: Senta L. Jantzen ORCID iD
Author: Ilias Skandalos ORCID iD
Author: Milan M. Milošević
Author: Valerio Vitali
Author: Joaquin Faneca
Author: Periklis Petropoulos ORCID iD
Author: Francisco Jurado Romero
Author: José Manuel Luque-González
Author: Íñigo Molina-Fernández
Author: Robert Halir
Author: Alejandro Ortega-Moñux
Author: J. G. Wangüemert-Pérez
Author: Daniele Melati
Author: Jens H. Schmid
Author: Pavel Cheben
Editor: Sonia M. García-Blanco
Editor: Pavel Cheben

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