Improved switching performance of a Molybdenum Oxide-based bi-layer resistive memory
Improved switching performance of a Molybdenum Oxide-based bi-layer resistive memory
In this paper, an atomic layer deposited memristor based on Al2O3/MoO3 bi-layer structure is reported. Compared with the single layer MoO3 based device, the bi-layer memristor demonstrates the improved bipolar switching behaviors including better endurance, higher ON/OFF ratio, and higher uniformity of the programming voltages. Space-charge-limited current (SCLC) model is used to explain the current conduction in our memristor. The formation and rupture of conductive oxygen vacancy-based filaments are illustrated as the proposed mechanism for the observed resistive switching behavior.
MoO, Resistive memory, atomic layer deposition, bipolar switching
575-578
Zhang, Tongjun
4a460cd9-f2c8-41db-8008-1cda74895b24
Sun, Kai
b7c648a3-7be8-4613-9d4d-1bf937fb487b
Zeimpekis, Ioannis
a2c354ec-3891-497c-adac-89b3a5d96af0
Huang, Ruomeng
c6187811-ef2f-4437-8333-595c0d6ac978
8 November 2022
Zhang, Tongjun
4a460cd9-f2c8-41db-8008-1cda74895b24
Sun, Kai
b7c648a3-7be8-4613-9d4d-1bf937fb487b
Zeimpekis, Ioannis
a2c354ec-3891-497c-adac-89b3a5d96af0
Huang, Ruomeng
c6187811-ef2f-4437-8333-595c0d6ac978
Zhang, Tongjun, Sun, Kai, Zeimpekis, Ioannis and Huang, Ruomeng
(2022)
Improved switching performance of a Molybdenum Oxide-based bi-layer resistive memory.
22nd IEEE International Conference on Nanotechnology : (IEEE-NANO 2022), Campus of Balearic Islands University (UIB), Palma, Spain.
04 - 08 Jul 2022.
.
(doi:10.1109/NANO54668.2022.9928600).
Record type:
Conference or Workshop Item
(Paper)
Abstract
In this paper, an atomic layer deposited memristor based on Al2O3/MoO3 bi-layer structure is reported. Compared with the single layer MoO3 based device, the bi-layer memristor demonstrates the improved bipolar switching behaviors including better endurance, higher ON/OFF ratio, and higher uniformity of the programming voltages. Space-charge-limited current (SCLC) model is used to explain the current conduction in our memristor. The formation and rupture of conductive oxygen vacancy-based filaments are illustrated as the proposed mechanism for the observed resistive switching behavior.
Text
Tongjun Zhang_Molybdenum oxide-based bi-layer resistive switching memory3.0
- Accepted Manuscript
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Published date: 8 November 2022
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© 2022 IEEE.
Venue - Dates:
22nd IEEE International Conference on Nanotechnology : (IEEE-NANO 2022), Campus of Balearic Islands University (UIB), Palma, Spain, 2022-07-04 - 2022-07-08
Keywords:
MoO, Resistive memory, atomic layer deposition, bipolar switching
Identifiers
Local EPrints ID: 474238
URI: http://eprints.soton.ac.uk/id/eprint/474238
PURE UUID: 9c99c5b9-c9e8-44fc-addb-c5cd91b29e11
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Date deposited: 16 Feb 2023 17:53
Last modified: 21 Sep 2024 01:47
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Author:
Tongjun Zhang
Author:
Ruomeng Huang
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