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Tungsten dichalcogenide WS2xSe2-2x films via single source precursor low-pressure CVD and their (thermo-)electric properties

Tungsten dichalcogenide WS2xSe2-2x films via single source precursor low-pressure CVD and their (thermo-)electric properties
Tungsten dichalcogenide WS2xSe2-2x films via single source precursor low-pressure CVD and their (thermo-)electric properties

Semiconducting transition metal dichalcogenides have gained increased interest as potential alternatives to graphene due to their tunable electronic bandgaps. In this study, we present the deposition of stoichiometric WS2xSe2−2x (0 ≤ x ≤ 1) binary and ternary thin films using the single source precursors, [WECl4(E′nBu2)] (E = S or Se; E′ = S or Se), via low-pressure chemical vapour deposition. Compositional and structural characterisations of the deposits have been performed by grazing-incidence X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, and Raman spectroscopy, confirming the phase purity and stoichiometry. Electrical characterisation via Hall measurements reveals high electrical conductivities for those films. Such high conductivity is likely related to Se and S vacancies in the films and can be tuned through an annealing process. The thermoelectric capabilities of the WS2xSe2−2x have been characterised with the use of variable-temperature Seebeck measurements, showing a peak power factor of 6 μW m−1 K−2 for the as-deposited WS2 film at 553 K.

2050-7488
9635 - 9645
Sethi, Vikesh
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Runacres, Danielle
aae55f94-b99a-4e9f-9d1b-8bcd3f2a93b6
Greenacre, Victoria
c665a38b-0b1a-4671-ac75-bf0679dd1c57
Shao, Li
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Hector, Andrew L.
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Levason, William
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De Groot, Kees
92cd2e02-fcc4-43da-8816-c86f966be90c
Reid, Gillian
37d35b11-40ce-48c5-a68e-f6ce04cd4037
Huang, Ruomeng
c6187811-ef2f-4437-8333-595c0d6ac978
Sethi, Vikesh
e0c3adf8-b928-46c4-b59f-4428cafe7774
Runacres, Danielle
aae55f94-b99a-4e9f-9d1b-8bcd3f2a93b6
Greenacre, Victoria
c665a38b-0b1a-4671-ac75-bf0679dd1c57
Shao, Li
e273c42f-6065-40f8-8077-35a0b8a2505a
Hector, Andrew L.
f19a8f31-b37f-4474-b32a-b7cf05b9f0e5
Levason, William
e7f6d7c7-643c-49f5-8b57-0ebbe1bb52cd
De Groot, Kees
92cd2e02-fcc4-43da-8816-c86f966be90c
Reid, Gillian
37d35b11-40ce-48c5-a68e-f6ce04cd4037
Huang, Ruomeng
c6187811-ef2f-4437-8333-595c0d6ac978

Sethi, Vikesh, Runacres, Danielle, Greenacre, Victoria, Shao, Li, Hector, Andrew L., Levason, William, De Groot, Kees, Reid, Gillian and Huang, Ruomeng (2023) Tungsten dichalcogenide WS2xSe2-2x films via single source precursor low-pressure CVD and their (thermo-)electric properties. Journal of Materials Chemistry A, 9635 - 9645. (doi:10.1039/D3TA00466J).

Record type: Article

Abstract

Semiconducting transition metal dichalcogenides have gained increased interest as potential alternatives to graphene due to their tunable electronic bandgaps. In this study, we present the deposition of stoichiometric WS2xSe2−2x (0 ≤ x ≤ 1) binary and ternary thin films using the single source precursors, [WECl4(E′nBu2)] (E = S or Se; E′ = S or Se), via low-pressure chemical vapour deposition. Compositional and structural characterisations of the deposits have been performed by grazing-incidence X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, and Raman spectroscopy, confirming the phase purity and stoichiometry. Electrical characterisation via Hall measurements reveals high electrical conductivities for those films. Such high conductivity is likely related to Se and S vacancies in the films and can be tuned through an annealing process. The thermoelectric capabilities of the WS2xSe2−2x have been characterised with the use of variable-temperature Seebeck measurements, showing a peak power factor of 6 μW m−1 K−2 for the as-deposited WS2 film at 553 K.

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Accepted/In Press date: 3 April 2023
e-pub ahead of print date: 3 April 2023
Published date: 2 May 2023
Additional Information: Funding Information: This work is financially supported by EPSRC via EP/P025137/1 and EP/V062689/1. V. S. and D. R. also thank EPSRC for their PhD studentships (EP/R513325/1, EP/N50947/1). We also thank the EPSRC for equipment funding under EP/K00509X/1 and EP/K009877/1. All data supporting this study are openly available from the University of Southampton repository at https://doi.org/10.5258/SOTON/D2572 . Funding Information: This work is financially supported by EPSRC via EP/P025137/1 and EP/V062689/1. V. S. and D. R. also thank EPSRC for their PhD studentships (EP/R513325/1, EP/N50947/1). We also thank the EPSRC for equipment funding under EP/K00509X/1 and EP/K009877/1. All data supporting this study are openly available from the University of Southampton repository at https://doi.org/10.5258/SOTON/D2572. Publisher Copyright: © 2023 The Royal Society of Chemistry.

Identifiers

Local EPrints ID: 476655
URI: http://eprints.soton.ac.uk/id/eprint/476655
ISSN: 2050-7488
PURE UUID: d3bd69f3-ee84-43b9-bc5c-c89f30ed311c
ORCID for Vikesh Sethi: ORCID iD orcid.org/0009-0002-2711-1889
ORCID for Danielle Runacres: ORCID iD orcid.org/0000-0002-2446-1763
ORCID for Victoria Greenacre: ORCID iD orcid.org/0000-0002-3381-9616
ORCID for Li Shao: ORCID iD orcid.org/0000-0001-6029-5574
ORCID for Andrew L. Hector: ORCID iD orcid.org/0000-0002-9964-2163
ORCID for William Levason: ORCID iD orcid.org/0000-0003-3540-0971
ORCID for Kees De Groot: ORCID iD orcid.org/0000-0002-3850-7101
ORCID for Gillian Reid: ORCID iD orcid.org/0000-0001-5349-3468
ORCID for Ruomeng Huang: ORCID iD orcid.org/0000-0003-1185-635X

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Date deposited: 10 May 2023 17:10
Last modified: 30 Aug 2024 02:04

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Contributors

Author: Vikesh Sethi ORCID iD
Author: Danielle Runacres ORCID iD
Author: Victoria Greenacre ORCID iD
Author: Li Shao ORCID iD
Author: William Levason ORCID iD
Author: Kees De Groot ORCID iD
Author: Gillian Reid ORCID iD
Author: Ruomeng Huang ORCID iD

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