Quantitative determination of photosensitivity proximity effects in multi-exposure direct UV writing for high density integrated optics
Quantitative determination of photosensitivity proximity effects in multi-exposure direct UV writing for high density integrated optics
UV direct writing is used to write planar channel waveguide gratings and simultaneously investigate photosensitivity proximity effects. Increases are seen up to 9µm away from the initial exposure with maximum effective index increase of 8.3 x 10-4.
Adikan, F.R.Mahamd
c553a74d-67f4-4566-b227-0890bdcb19c3
Gates, J.C.
b71e31a1-8caa-477e-8556-b64f6cae0dc2
Gawith, C.B.E.
926665c0-84c7-4a1d-ae19-ee6d7d14c43e
Smith, P.G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6
Adikan, F.R.Mahamd
c553a74d-67f4-4566-b227-0890bdcb19c3
Gates, J.C.
b71e31a1-8caa-477e-8556-b64f6cae0dc2
Gawith, C.B.E.
926665c0-84c7-4a1d-ae19-ee6d7d14c43e
Smith, P.G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6
Adikan, F.R.Mahamd, Gates, J.C., Gawith, C.B.E. and Smith, P.G.R.
(2007)
Quantitative determination of photosensitivity proximity effects in multi-exposure direct UV writing for high density integrated optics.
Conference on Lasers and Electro-Optics (CLEO)-Europe/International Quantum Electronics Conference (IQEC) 2007, , Munich, Germany.
17 - 22 Jun 2007.
1 pp
.
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Conference or Workshop Item
(Paper)
Abstract
UV direct writing is used to write planar channel waveguide gratings and simultaneously investigate photosensitivity proximity effects. Increases are seen up to 9µm away from the initial exposure with maximum effective index increase of 8.3 x 10-4.
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e-pub ahead of print date: June 2007
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CE4-3-Tue
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Conference on Lasers and Electro-Optics (CLEO)-Europe/International Quantum Electronics Conference (IQEC) 2007, , Munich, Germany, 2007-06-17 - 2007-06-22
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Local EPrints ID: 47824
URI: http://eprints.soton.ac.uk/id/eprint/47824
PURE UUID: 025d1f87-0225-4a35-b0c0-98778d41a644
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Date deposited: 13 Aug 2007
Last modified: 16 Mar 2024 03:18
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