Interleaved angled MMI CWDM structure on the SOI platform
Interleaved angled MMI CWDM structure on the SOI platform
We have demonstrated a low-insertion-loss 8-channel interleaved angled MMI CWDM structure on the SOI platform. It requires only a single-step lithography and etching for fabrication and has good tolerance to fabrication errors.
21-22
Hu, Y.
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Gardes, F. Y.
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Thomson, D. J.
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Mashanovich, G. Z.
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Reed, G. T.
ca08dd60-c072-4d7d-b254-75714d570139
30 August 2013
Hu, Y.
38fe48b3-1609-4834-ad54-dc823e3a98b3
Gardes, F. Y.
7a49fc6d-dade-4099-b016-c60737cb5bb2
Thomson, D. J.
17c1626c-2422-42c6-98e0-586ae220bcda
Mashanovich, G. Z.
c806e262-af80-4836-b96f-319425060051
Reed, G. T.
ca08dd60-c072-4d7d-b254-75714d570139
Hu, Y., Gardes, F. Y., Thomson, D. J., Mashanovich, G. Z. and Reed, G. T.
(2013)
Interleaved angled MMI CWDM structure on the SOI platform.
In 2013 IEEE 10th International Conference on Group IV Photonics, GFP 2013.
.
(doi:10.1109/Group4.2013.6644470).
Record type:
Conference or Workshop Item
(Paper)
Abstract
We have demonstrated a low-insertion-loss 8-channel interleaved angled MMI CWDM structure on the SOI platform. It requires only a single-step lithography and etching for fabrication and has good tolerance to fabrication errors.
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Published date: 30 August 2013
Venue - Dates:
2013 IEEE 10th International Conference on Group IV Photonics, GFP 2013, , Seoul, Korea, Republic of, 2013-08-28 - 2013-08-30
Identifiers
Local EPrints ID: 478978
URI: http://eprints.soton.ac.uk/id/eprint/478978
ISSN: 1949-2081
PURE UUID: a2e92478-28ce-4e9d-a930-441ec57cf569
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Date deposited: 17 Jul 2023 16:34
Last modified: 29 Oct 2024 02:45
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Contributors
Author:
Y. Hu
Author:
F. Y. Gardes
Author:
D. J. Thomson
Author:
G. Z. Mashanovich
Author:
G. T. Reed
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