Sub-ps 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxides and magnetron-sputtered metal oxide optical coatings
Sub-ps 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxides and magnetron-sputtered metal oxide optical coatings
Crystalline sesquioxide films (Sc2O3, Y2O3, Lu2O3) produced by pulsed-laser deposition were examined for laser damage resistance with pulses of 500 fs duration, at a wavelength of 1030 nm and at a 10 Hz repetition rate. Comparable tests were performed with amorphous magnetron-sputtered thin films (SiO2, HfO2, Nb2O5). We found the laser-induced damage thresholds of the sesquioxides are close to those of HfO2 in the multi-pulse test regime. The results are the basis for designs of damage resistant reflective components used in ultrashort-pulse lasers.
Laser-induced damage testing, Metal oxides, Pulsed-laser deposition, Sesquioxides, Sub-picosecond regime
Stehlík, Marek
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Govindassamy, Goby
759ac977-bbd5-48e3-b98a-8c5fd0dbfafe
Zideluns, Janis
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Lemarchand, Fabien
db848698-a70b-41d4-aed0-cf334e9661eb
Wagner, Frank
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Lumeau, Julien
ff181650-ed88-4ef7-8962-8a19abbdc7ab
Mackenzie, Jacob
1d82c826-fdbf-425b-ac04-be43ccf12008
Gallais, Laurent
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2 December 2022
Stehlík, Marek
1700b078-225f-44fa-a03c-e2b4f6583187
Govindassamy, Goby
759ac977-bbd5-48e3-b98a-8c5fd0dbfafe
Zideluns, Janis
fd6fdf4a-4cc2-435c-8814-83eefe68bcec
Lemarchand, Fabien
db848698-a70b-41d4-aed0-cf334e9661eb
Wagner, Frank
1f8d1a50-e21c-4dc3-9e07-f72d2da5cf66
Lumeau, Julien
ff181650-ed88-4ef7-8962-8a19abbdc7ab
Mackenzie, Jacob
1d82c826-fdbf-425b-ac04-be43ccf12008
Gallais, Laurent
4acfdda7-8020-4865-a7d6-6ee854c357c7
Stehlík, Marek, Govindassamy, Goby, Zideluns, Janis, Lemarchand, Fabien, Wagner, Frank, Lumeau, Julien, Mackenzie, Jacob and Gallais, Laurent
(2022)
Sub-ps 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxides and magnetron-sputtered metal oxide optical coatings.
Carr, Christopher Wren, Ristau, Detlev and Menoni, Carmen S.
(eds.)
In 54th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2022.
vol. 12300,
SPIE.
13 pp
.
(doi:10.1117/12.2641792).
Record type:
Conference or Workshop Item
(Paper)
Abstract
Crystalline sesquioxide films (Sc2O3, Y2O3, Lu2O3) produced by pulsed-laser deposition were examined for laser damage resistance with pulses of 500 fs duration, at a wavelength of 1030 nm and at a 10 Hz repetition rate. Comparable tests were performed with amorphous magnetron-sputtered thin films (SiO2, HfO2, Nb2O5). We found the laser-induced damage thresholds of the sesquioxides are close to those of HfO2 in the multi-pulse test regime. The results are the basis for designs of damage resistant reflective components used in ultrashort-pulse lasers.
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Published date: 2 December 2022
Additional Information:
Funding Information: This project has received funding from the European Union’s Horizon 2020 research and innovation programme under the Marie Sk lodowska-Curie grant agreement No 813159. The authors acknowledge the EPSRC for financial support of the Rigaku SmartLab via grants (EP/K009877/1), (EP/K00509X/1) and (EP/V035975/1), an EPSRC Doctoral Prize EP/T517859/1, and grant nos. EP/N018281/1 and EP/P027644/1.
Venue - Dates:
54th Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials 2022, , Rochester, United States, 2022-09-18 - 2022-09-21
Keywords:
Laser-induced damage testing, Metal oxides, Pulsed-laser deposition, Sesquioxides, Sub-picosecond regime
Identifiers
Local EPrints ID: 481818
URI: http://eprints.soton.ac.uk/id/eprint/481818
ISSN: 0277-786X
PURE UUID: 6c073fe5-38d7-488b-8daa-a3dc4cede29e
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Date deposited: 08 Sep 2023 16:49
Last modified: 18 Mar 2024 02:52
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Contributors
Author:
Marek Stehlík
Author:
Goby Govindassamy
Author:
Janis Zideluns
Author:
Fabien Lemarchand
Author:
Frank Wagner
Author:
Julien Lumeau
Author:
Laurent Gallais
Editor:
Christopher Wren Carr
Editor:
Detlev Ristau
Editor:
Carmen S. Menoni
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