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Low-temperature sintering of l-alanine-functionalized metallic copper particles affording conductive films with excellent oxidative stability

Low-temperature sintering of l-alanine-functionalized metallic copper particles affording conductive films with excellent oxidative stability
Low-temperature sintering of l-alanine-functionalized metallic copper particles affording conductive films with excellent oxidative stability
Here, the alpha amino acid l-alanine is employed as both a capping and stabilizing agent in the aqueous synthesis of submicron-sized metallic copper particles under ambient atmospheric conditions. The reduction of the copper(II) precursor is achieved using l-ascorbic acid (vitamin C) as the reducing agent. The nature of the complex formed between l-alanine and the copper(II) precursor, pH of the medium, temperature, and the relative proportion of capping agent are found to play a significant role in determining the size, shape, and oxidative stability of the resulting particles. The adsorbed l-alanine is shown to act as a barrier imparting excellent thermal stability to capped copper particles, delaying the onset of temperature-induced aerial oxidation. The stability of the particles is complemented by highly favorable sintering conditions, rendering the formation of conductive copper films at significantly lower temperatures (T ≤ 120 °C) compared to alternative preparation methods. The resulting copper films are well-passivated by residual surface l-alanine molecules, promoting long-term stability without hindering the surface chemistry of the copper film as evidenced by the catalytic activity. Contrary to the popular belief that ligands with long carbon chains are best for providing stability, these findings demonstrate that very small ligands can provide highly effective stability to copper without significantly deteriorating its functionality while facilitating low-temperature sintering, which is a key requirement for emerging flexible electronic applications.
2502-2515
Pereira, H. Jessica
99b16ebd-fa9f-41f0-a4fe-f0c0e22f6697
Killalea, C. Elizabeth
d75cc255-7bb4-40e6-af83-6176f328c14d
Amabilino, David B.
876a1d25-d3a4-4d71-89ed-12aa21342c6a
Pereira, H. Jessica
99b16ebd-fa9f-41f0-a4fe-f0c0e22f6697
Killalea, C. Elizabeth
d75cc255-7bb4-40e6-af83-6176f328c14d
Amabilino, David B.
876a1d25-d3a4-4d71-89ed-12aa21342c6a

Pereira, H. Jessica, Killalea, C. Elizabeth and Amabilino, David B. (2022) Low-temperature sintering of l-alanine-functionalized metallic copper particles affording conductive films with excellent oxidative stability. ACS Applied Electronic Materials, 4 (5), 2502-2515. (doi:10.1021/acsaelm.2c00275).

Record type: Article

Abstract

Here, the alpha amino acid l-alanine is employed as both a capping and stabilizing agent in the aqueous synthesis of submicron-sized metallic copper particles under ambient atmospheric conditions. The reduction of the copper(II) precursor is achieved using l-ascorbic acid (vitamin C) as the reducing agent. The nature of the complex formed between l-alanine and the copper(II) precursor, pH of the medium, temperature, and the relative proportion of capping agent are found to play a significant role in determining the size, shape, and oxidative stability of the resulting particles. The adsorbed l-alanine is shown to act as a barrier imparting excellent thermal stability to capped copper particles, delaying the onset of temperature-induced aerial oxidation. The stability of the particles is complemented by highly favorable sintering conditions, rendering the formation of conductive copper films at significantly lower temperatures (T ≤ 120 °C) compared to alternative preparation methods. The resulting copper films are well-passivated by residual surface l-alanine molecules, promoting long-term stability without hindering the surface chemistry of the copper film as evidenced by the catalytic activity. Contrary to the popular belief that ligands with long carbon chains are best for providing stability, these findings demonstrate that very small ligands can provide highly effective stability to copper without significantly deteriorating its functionality while facilitating low-temperature sintering, which is a key requirement for emerging flexible electronic applications.

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Accepted/In Press date: 13 April 2022
e-pub ahead of print date: 24 May 2022

Identifiers

Local EPrints ID: 483225
URI: http://eprints.soton.ac.uk/id/eprint/483225
PURE UUID: 6b348727-5e7d-4c6c-9f38-b4c5413f9513
ORCID for H. Jessica Pereira: ORCID iD orcid.org/0000-0002-2883-4686

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Date deposited: 26 Oct 2023 16:47
Last modified: 18 Mar 2024 04:14

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Contributors

Author: H. Jessica Pereira ORCID iD
Author: C. Elizabeth Killalea
Author: David B. Amabilino

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