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Low cost polysilicon nanowires for chemical sensing based on top-down photolithography and dry etch

Low cost polysilicon nanowires for chemical sensing based on top-down photolithography and dry etch
Low cost polysilicon nanowires for chemical sensing based on top-down photolithography and dry etch
Sun, Kai
b7c648a3-7be8-4613-9d4d-1bf937fb487b
Sun, Kai
b7c648a3-7be8-4613-9d4d-1bf937fb487b

Sun, Kai (2011) Low cost polysilicon nanowires for chemical sensing based on top-down photolithography and dry etch. S2K 2011, University of Surrey, Guildford, United Kingdom. 21 - 22 Jun 2011.

Record type: Conference or Workshop Item (Poster)

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More information

Published date: 21 June 2011
Venue - Dates: S2K 2011, University of Surrey, Guildford, United Kingdom, 2011-06-21 - 2011-06-22

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Local EPrints ID: 485473
URI: http://eprints.soton.ac.uk/id/eprint/485473
PURE UUID: 58297992-425c-4230-98cf-ada8ac92ad52

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Date deposited: 07 Dec 2023 17:31
Last modified: 07 Dec 2023 17:31

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