Zinc oxide nanostructure deposition into sub-5 nm vertical mesopores in silica hard templates by atomic layer deposition

Abstract

Nanostructures synthesised by hard-templating assisted methods are advantageous as they retain the size and morphology of the host templates which are vital characteristics for their intended applications. A number of techniques have been employed to deposit materials inside porous templates, such as electrodeposition, vapour deposition, lithography, melt and solution filling, but most of these efforts have been applied with pore sizes higher in the mesoporous regime or even larger. Here, we explore atomic layer deposition (ALD) as a method for nanostructure deposition into mesoporous hard templates consisting of mesoporous silica films with sub-5 nm pore diameters. The zinc oxide deposited into the films was characterised by small-angle X-ray scattering, X-ray diffraction and energy-dispersive X-ray analysis.

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Identifiers

ORCID for Tauqir Nasir: orcid.org/0000-0003-0457-766X

ORCID for Andrew L. Hector: orcid.org/0000-0002-9964-2163

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