Solution-processed low resistivity zinc oxide nanoparticle film with enhanced stability using EVOH
Solution-processed low resistivity zinc oxide nanoparticle film with enhanced stability using EVOH
This paper proposes a solution-based fabrication process of the zinc oxide nanoparticle (ZnO NP) film. It achieves a resistivity comparable to that of ZnO deposited by using physical and chemical vapor deposition methods. The process involves exposing the solution-processed ZnO NP film to 365 nm ultraviolet light and passivating it with an ethylene vinyl alcohol (EVOH) encapsulant of 80 μm under a vacuum. The manufacturing process has a maximum temperature of 190 °C, enabling use on flexible substrates, such as polyimide. The fabricated ZnO film has a sheet resistance of 2.5 × 104 Ω/□ and a thickness of 2.35 μm. The EVOH passivation layer enhanced the film stability, protecting it when exposed to the ambient environment. The resistivity of the ZnO NP layer with EVOH passivation remains unchanged after 60 days in an ambient environment.
ZnO nanoparticle, electrical stability, low resistivity, solution-based process, surface oxygen absorbance, surface passivation
4277-4287
Qu, Mengyang
111ae526-7a41-4ec2-96ac-f04e29a00c99
Yong, Sheng
688cbcf0-b32e-4b2b-9891-a0e0e1f59d71
Rowlinson, Ben D.
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Green, Amanda A.
de81db71-8af8-4ee8-a18a-1e4b570c8c3a
Beeby, Stephen
ba565001-2812-4300-89f1-fe5a437ecb0d
Chong, Harold M.H.
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De Planque, Maurits R.R.
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25 June 2024
Qu, Mengyang
111ae526-7a41-4ec2-96ac-f04e29a00c99
Yong, Sheng
688cbcf0-b32e-4b2b-9891-a0e0e1f59d71
Rowlinson, Ben D.
bc965d73-a1d3-4e19-bff3-e57ee4a0acbe
Green, Amanda A.
de81db71-8af8-4ee8-a18a-1e4b570c8c3a
Beeby, Stephen
ba565001-2812-4300-89f1-fe5a437ecb0d
Chong, Harold M.H.
795aa67f-29e5-480f-b1bc-9bd5c0d558e1
De Planque, Maurits R.R.
a1d33d13-f516-44fb-8d2c-c51d18bc21ba
Qu, Mengyang, Yong, Sheng, Rowlinson, Ben D., Green, Amanda A., Beeby, Stephen, Chong, Harold M.H. and De Planque, Maurits R.R.
(2024)
Solution-processed low resistivity zinc oxide nanoparticle film with enhanced stability using EVOH.
ACS Applied Electronic Materials, 6 (6), .
(doi:10.1021/acsaelm.4c00355).
Abstract
This paper proposes a solution-based fabrication process of the zinc oxide nanoparticle (ZnO NP) film. It achieves a resistivity comparable to that of ZnO deposited by using physical and chemical vapor deposition methods. The process involves exposing the solution-processed ZnO NP film to 365 nm ultraviolet light and passivating it with an ethylene vinyl alcohol (EVOH) encapsulant of 80 μm under a vacuum. The manufacturing process has a maximum temperature of 190 °C, enabling use on flexible substrates, such as polyimide. The fabricated ZnO film has a sheet resistance of 2.5 × 104 Ω/□ and a thickness of 2.35 μm. The EVOH passivation layer enhanced the film stability, protecting it when exposed to the ambient environment. The resistivity of the ZnO NP layer with EVOH passivation remains unchanged after 60 days in an ambient environment.
Text
qu-et-al-2024-solution-processed-low-resistivity-zinc-oxide-nanoparticle-film-with-enhanced-stability-using-evoh
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Accepted/In Press date: 16 May 2024
e-pub ahead of print date: 30 May 2024
Published date: 25 June 2024
Additional Information:
Publisher Copyright:
© 2024 The Authors. Published by American Chemical Society.
Keywords:
ZnO nanoparticle, electrical stability, low resistivity, solution-based process, surface oxygen absorbance, surface passivation
Identifiers
Local EPrints ID: 492131
URI: http://eprints.soton.ac.uk/id/eprint/492131
ISSN: 2637-6113
PURE UUID: bf291974-f2d2-4cff-b79b-ca9cb3c8f7ee
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Date deposited: 17 Jul 2024 16:52
Last modified: 24 Jul 2024 02:02
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