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Solution-processed low resistivity zinc oxide nanoparticle film with enhanced stability using UV-Vacuum-Heat (UVVH) treatment and polyvinyl alcohol/ polydimethylsiloxane passivation

Solution-processed low resistivity zinc oxide nanoparticle film with enhanced stability using UV-Vacuum-Heat (UVVH) treatment and polyvinyl alcohol/ polydimethylsiloxane passivation
Solution-processed low resistivity zinc oxide nanoparticle film with enhanced stability using UV-Vacuum-Heat (UVVH) treatment and polyvinyl alcohol/ polydimethylsiloxane passivation
Electronic devices made from ZnO nanoparticles (ZnO NPs) are limited by high resistivity due to oxygen molecules adsorption on the surface. However, ultraviolet (UV) light can be used to temporarily release oxygen molecules from the surface of the ZnO NPs and increase the majority electron carrier concentration. It has also been experimentally observed that ZnO NPs exhibit low resistivity after exposure to water molecules in ambient environment. The unstable resistivity of the ZnO NPs film when exposed to air and moisture makes it difficult to fabricate and use as an electronic device for sensing applications. This article proposes a UVVH fabrication process that involves photoelectric interactions between ZnO NPs, UV exposure, oxygen, and polymer passivation. By fabricating ZnO NPs films under 365 nm UV irradiation in a vacuum environment, the process aims to achieve two primary goals: enhancing the carrier concentration and reducing post-fabrication oxygen adsorption by passivating the films with a polyvinyl alcohol (PVA) and polydimethylsiloxane (PDMS) composite layer.
Qu, Mengyang
111ae526-7a41-4ec2-96ac-f04e29a00c99
Yong, Sheng
688cbcf0-b32e-4b2b-9891-a0e0e1f59d71
Rowlinson, Ben
bc965d73-a1d3-4e19-bff3-e57ee4a0acbe
Green, Amanda
de81db71-8af8-4ee8-a18a-1e4b570c8c3a
De Planque, Maurits RR
a1d33d13-f516-44fb-8d2c-c51d18bc21ba
Beeby, Stephen
ba565001-2812-4300-89f1-fe5a437ecb0d
Chong, Harold
795aa67f-29e5-480f-b1bc-9bd5c0d558e1
Qu, Mengyang
111ae526-7a41-4ec2-96ac-f04e29a00c99
Yong, Sheng
688cbcf0-b32e-4b2b-9891-a0e0e1f59d71
Rowlinson, Ben
bc965d73-a1d3-4e19-bff3-e57ee4a0acbe
Green, Amanda
de81db71-8af8-4ee8-a18a-1e4b570c8c3a
De Planque, Maurits RR
a1d33d13-f516-44fb-8d2c-c51d18bc21ba
Beeby, Stephen
ba565001-2812-4300-89f1-fe5a437ecb0d
Chong, Harold
795aa67f-29e5-480f-b1bc-9bd5c0d558e1

Qu, Mengyang, Yong, Sheng, Rowlinson, Ben, Green, Amanda, De Planque, Maurits RR, Beeby, Stephen and Chong, Harold (2024) Solution-processed low resistivity zinc oxide nanoparticle film with enhanced stability using UV-Vacuum-Heat (UVVH) treatment and polyvinyl alcohol/ polydimethylsiloxane passivation. In 50th International Micro and Nano Engineering Conference, Montpellier, France, Montpellier, France. 16 - 19 Sep 2024.

Record type: Conference or Workshop Item (Paper)

Abstract

Electronic devices made from ZnO nanoparticles (ZnO NPs) are limited by high resistivity due to oxygen molecules adsorption on the surface. However, ultraviolet (UV) light can be used to temporarily release oxygen molecules from the surface of the ZnO NPs and increase the majority electron carrier concentration. It has also been experimentally observed that ZnO NPs exhibit low resistivity after exposure to water molecules in ambient environment. The unstable resistivity of the ZnO NPs film when exposed to air and moisture makes it difficult to fabricate and use as an electronic device for sensing applications. This article proposes a UVVH fabrication process that involves photoelectric interactions between ZnO NPs, UV exposure, oxygen, and polymer passivation. By fabricating ZnO NPs films under 365 nm UV irradiation in a vacuum environment, the process aims to achieve two primary goals: enhancing the carrier concentration and reducing post-fabrication oxygen adsorption by passivating the films with a polyvinyl alcohol (PVA) and polydimethylsiloxane (PDMS) composite layer.

Text
MNE abstract 2024_MQu Accepted Manuscript - Other
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Slideshow
UVVH PVA-PDMS_slides - Proof
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More information

Published date: 16 September 2024
Venue - Dates: The 50th MNE (Micro and Nano Engineering) International Conference, , Montpellier, France, 2024-09-16 - 2024-09-19

Identifiers

Local EPrints ID: 497195
URI: http://eprints.soton.ac.uk/id/eprint/497195
PURE UUID: 298c0c58-6485-4d0f-b6df-4ca54767a0dc
ORCID for Mengyang Qu: ORCID iD orcid.org/0009-0003-3685-8658
ORCID for Sheng Yong: ORCID iD orcid.org/0000-0002-8588-5981
ORCID for Maurits RR De Planque: ORCID iD orcid.org/0000-0002-8787-0513
ORCID for Stephen Beeby: ORCID iD orcid.org/0000-0002-0800-1759
ORCID for Harold Chong: ORCID iD orcid.org/0000-0002-7110-5761

Catalogue record

Date deposited: 15 Jan 2025 18:06
Last modified: 22 Aug 2025 02:31

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Contributors

Author: Mengyang Qu ORCID iD
Author: Sheng Yong ORCID iD
Author: Ben Rowlinson
Author: Amanda Green
Author: Maurits RR De Planque ORCID iD
Author: Stephen Beeby ORCID iD
Author: Harold Chong ORCID iD

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