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Fabrication of macroporous polysilicon by using nanosphere lithography

Fabrication of macroporous polysilicon by using nanosphere lithography
Fabrication of macroporous polysilicon by using nanosphere lithography
Nanosphere lithography (NSL) has been demonstrated to be a feasible, alternative technique for the fabrication of macroporous polysilicon. The diameter of the pore can be controlled by RIE of the fabricated nanospheres template using Ar/O gas mixtures at pressure of 5mTorr and rf power of 100W.
macroporous polysilicon, nanosphere lithography (NSL)
Chau, C.F.
cebb4b2c-ed4f-4e79-8ab7-56fd05701ecb
Melvin, T.
fd87f5eb-2bb9-48fa-b7be-7100ace9c50f
Chau, C.F.
cebb4b2c-ed4f-4e79-8ab7-56fd05701ecb
Melvin, T.
fd87f5eb-2bb9-48fa-b7be-7100ace9c50f

Chau, C.F. and Melvin, T. (2007) Fabrication of macroporous polysilicon by using nanosphere lithography. 18th Workshop on Micromachining, Micromechanics and Microsystems (MME 2007). 16 - 18 Sep 2007. 4 pp .

Record type: Conference or Workshop Item (Paper)

Abstract

Nanosphere lithography (NSL) has been demonstrated to be a feasible, alternative technique for the fabrication of macroporous polysilicon. The diameter of the pore can be controlled by RIE of the fabricated nanospheres template using Ar/O gas mixtures at pressure of 5mTorr and rf power of 100W.

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More information

Published date: 2007
Venue - Dates: 18th Workshop on Micromachining, Micromechanics and Microsystems (MME 2007), 2007-09-16 - 2007-09-18
Keywords: macroporous polysilicon, nanosphere lithography (NSL)

Identifiers

Local EPrints ID: 49794
URI: https://eprints.soton.ac.uk/id/eprint/49794
PURE UUID: 89daf6dd-d010-4feb-a746-ac84e5c34252

Catalogue record

Date deposited: 04 Dec 2007
Last modified: 13 Mar 2019 20:53

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