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Low-temperature solution-processed growth of ternary (Bi1−xSbx)2S3 films

Low-temperature solution-processed growth of ternary (Bi1−xSbx)2S3 films
Low-temperature solution-processed growth of ternary (Bi1−xSbx)2S3 films

The development of low-temperature deposition methods for ternary metal chalcogenides is significant for advancing electronics and optoelectronic devices, where precise compositional control remains a key challenge. Here, we report a simple, low-temperature, and scalable in situ solvothermal technique for the deposition of ternary (Bi 1−xSb x) 2S 3 films using structurally compatible single-source precursors, [Bi{S 2P{O(Pr) 2} 3}] and [Sb{S 2P{O(Pr) 2} 3}]. This one-pot chemical route facilitates precise control over composition and film quality without the need for additional processing steps. Compositional and structural characterisation confirmed the successful formation of orthorhombic (Bi 1−xSb x) 2S 3 phases across the full composition range (x = 0–1). The systematic shift in X-ray diffraction peak positions and lattice parameters with varying Sb content is consistent with Vegard's law, indicating the formation of a homogeneous, compositionally tunable ternary alloy. Scanning electron microscopy revealed pronounced morphology changes correlated with the Sb mole fraction, highlighting the influence of composition on microstructural evolution. UV-vis spectroscopy further demonstrated optical tunability, with bandgaps increasing from 1.82 to 2.04 eV as Sb content increased. These results underscore the effectiveness of precursor ratio adjustment for controlling final film composition and properties, showcasing the versatility of this low-temperature solvothermal approach for synthesising phase-pure, compositionally engineered mixed-metal chalcogenide thin films.

2050-7526
19683-19692
Harke, Sayali Shrishail
a3fc2dcf-3445-46ca-bfd3-e625d96c1dd4
Kapur, Omesh
2be52575-505f-472f-ad9c-ce6fe84c20fd
Huang, Ruomeng
c6187811-ef2f-4437-8333-595c0d6ac978
Gurnani, Chitra
18063024-d052-4fe3-8a79-fdecd227bc2c
Harke, Sayali Shrishail
a3fc2dcf-3445-46ca-bfd3-e625d96c1dd4
Kapur, Omesh
2be52575-505f-472f-ad9c-ce6fe84c20fd
Huang, Ruomeng
c6187811-ef2f-4437-8333-595c0d6ac978
Gurnani, Chitra
18063024-d052-4fe3-8a79-fdecd227bc2c

Harke, Sayali Shrishail, Kapur, Omesh, Huang, Ruomeng and Gurnani, Chitra (2025) Low-temperature solution-processed growth of ternary (Bi1−xSbx)2S3 films. Journal of Materials Chemistry C, 13 (38), 19683-19692. (doi:10.1039/d5tc02494c).

Record type: Article

Abstract

The development of low-temperature deposition methods for ternary metal chalcogenides is significant for advancing electronics and optoelectronic devices, where precise compositional control remains a key challenge. Here, we report a simple, low-temperature, and scalable in situ solvothermal technique for the deposition of ternary (Bi 1−xSb x) 2S 3 films using structurally compatible single-source precursors, [Bi{S 2P{O(Pr) 2} 3}] and [Sb{S 2P{O(Pr) 2} 3}]. This one-pot chemical route facilitates precise control over composition and film quality without the need for additional processing steps. Compositional and structural characterisation confirmed the successful formation of orthorhombic (Bi 1−xSb x) 2S 3 phases across the full composition range (x = 0–1). The systematic shift in X-ray diffraction peak positions and lattice parameters with varying Sb content is consistent with Vegard's law, indicating the formation of a homogeneous, compositionally tunable ternary alloy. Scanning electron microscopy revealed pronounced morphology changes correlated with the Sb mole fraction, highlighting the influence of composition on microstructural evolution. UV-vis spectroscopy further demonstrated optical tunability, with bandgaps increasing from 1.82 to 2.04 eV as Sb content increased. These results underscore the effectiveness of precursor ratio adjustment for controlling final film composition and properties, showcasing the versatility of this low-temperature solvothermal approach for synthesising phase-pure, compositionally engineered mixed-metal chalcogenide thin films.

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Accepted/In Press date: 20 August 2025
Published date: 2 October 2025
Additional Information: Publisher Copyright: © 2025 The Royal Society of Chemistry.

Identifiers

Local EPrints ID: 507046
URI: http://eprints.soton.ac.uk/id/eprint/507046
ISSN: 2050-7526
PURE UUID: 100379f4-5eef-4b1a-9a6e-094e35c1ae13
ORCID for Ruomeng Huang: ORCID iD orcid.org/0000-0003-1185-635X

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Date deposited: 25 Nov 2025 18:02
Last modified: 04 Dec 2025 02:42

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Contributors

Author: Sayali Shrishail Harke
Author: Omesh Kapur
Author: Ruomeng Huang ORCID iD
Author: Chitra Gurnani

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