Laser-assisted-etching for hybrid polymer-silica lab-on-chip
Laser-assisted-etching for hybrid polymer-silica lab-on-chip
Femtosecond laser-assisted-etching methods combining sub-surface modification and ablation for enhanced geometry control of micron-scale silica surface channels. Subsequent laser smoothing produces optical-quality surface roughness and polymer de position enables polymer-silica waveguiding, lab-on-chip, sensing applications.
Carbon dioxide lasers, Femtosecond lasers, Lasers, Polymers, Roughness, Ultrafast lasers
Ong, George T.
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Lee, T.
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Maniewski, P.
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McQuillan, S.
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Beresna, M.
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Ismaeel, R.
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Brambilla, G.
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2024
Ong, George T.
1ac3482e-8f2a-4b82-899c-16f7c3751771
Lee, T.
beb3b88e-3e5a-4c3f-8636-bb6de8040fcc
Maniewski, P.
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McQuillan, S.
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Beresna, M.
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Ismaeel, R.
c1fb0984-a4c0-484a-8aef-625d48a62086
Brambilla, G.
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Ong, George T., Lee, T., Maniewski, P., McQuillan, S., Beresna, M., Ismaeel, R. and Brambilla, G.
(2024)
Laser-assisted-etching for hybrid polymer-silica lab-on-chip.
In 2024 Conference on Lasers and Electro-Optics Pacific Rim (CLEO-PR).
Optica Publishing Group..
Record type:
Conference or Workshop Item
(Paper)
Abstract
Femtosecond laser-assisted-etching methods combining sub-surface modification and ablation for enhanced geometry control of micron-scale silica surface channels. Subsequent laser smoothing produces optical-quality surface roughness and polymer de position enables polymer-silica waveguiding, lab-on-chip, sensing applications.
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More information
Published date: 2024
Keywords:
Carbon dioxide lasers, Femtosecond lasers, Lasers, Polymers, Roughness, Ultrafast lasers
Identifiers
Local EPrints ID: 509332
URI: http://eprints.soton.ac.uk/id/eprint/509332
PURE UUID: b35dac0f-b9ba-4e9e-8bf0-cfe8efcffd6f
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Date deposited: 19 Feb 2026 17:31
Last modified: 20 Feb 2026 03:12
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Contributors
Author:
George T. Ong
Author:
T. Lee
Author:
P. Maniewski
Author:
S. McQuillan
Author:
M. Beresna
Author:
R. Ismaeel
Author:
G. Brambilla
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