Flexible coherent diffraction lithography by tunable phase arrays in lithium niobate crystals
Flexible coherent diffraction lithography by tunable phase arrays in lithium niobate crystals
Flexible coherent diffraction lithography is proposed and preliminarily tested by means of an optical phase mask. The phase mask consisted of a two-dimensional hexagonal lattice of reversed ferroelectric domains engineered in a z-cut lithium niobate substrate and was electro-optically tunable. Appropriate phase shift values across adjacent reversed domains were induced by the application of an external electric field along the z-axis of the crystal via transparent electrodes. Photolithographic exposures of the self-imaging near-field diffraction intensity patterns, at various planes corresponding to the Talbot distances, were performed by using different values of the driving electric field signal.
1950-1953
Paturzo, M.
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Grilli, S.
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Mailis, S.
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Coppola, G.
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Iodice, M.
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Gioffré, M.
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Ferraro, P.
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15 April 2008
Paturzo, M.
16617f28-ca22-41d6-b3f5-41d200d78748
Grilli, S.
4e81916a-630b-4178-9a53-d6cc6b20c490
Mailis, S.
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Coppola, G.
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Iodice, M.
ad2ccfcf-181b-4418-990d-7f2b44a1ddc9
Gioffré, M.
2c5f6929-166c-48ad-ab53-45e86a07bbfc
Ferraro, P.
77cb5d1d-2e86-4afb-967b-a42152a3173f
Paturzo, M., Grilli, S., Mailis, S., Coppola, G., Iodice, M., Gioffré, M. and Ferraro, P.
(2008)
Flexible coherent diffraction lithography by tunable phase arrays in lithium niobate crystals.
Optics Communications, 281 (8), .
(doi:10.1016/j.optcom.2007.12.056).
Abstract
Flexible coherent diffraction lithography is proposed and preliminarily tested by means of an optical phase mask. The phase mask consisted of a two-dimensional hexagonal lattice of reversed ferroelectric domains engineered in a z-cut lithium niobate substrate and was electro-optically tunable. Appropriate phase shift values across adjacent reversed domains were induced by the application of an external electric field along the z-axis of the crystal via transparent electrodes. Photolithographic exposures of the self-imaging near-field diffraction intensity patterns, at various planes corresponding to the Talbot distances, were performed by using different values of the driving electric field signal.
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Published date: 15 April 2008
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Local EPrints ID: 52047
URI: http://eprints.soton.ac.uk/id/eprint/52047
ISSN: 0030-4018
PURE UUID: 7c3a5ff6-fa8a-45e1-96f8-cc7b72243ade
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Date deposited: 09 Jun 2008
Last modified: 15 Mar 2024 10:22
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Contributors
Author:
M. Paturzo
Author:
S. Grilli
Author:
S. Mailis
Author:
G. Coppola
Author:
M. Iodice
Author:
M. Gioffré
Author:
P. Ferraro
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