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Novel fabrication methods for submicrometer Josephson junction qubits

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Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al2O3/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks.

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Potts, A., Routley, P.R., Parker, G.J., Baumberg, J.J. and de Groot, P.A.J. (2001) Novel fabrication methods for submicrometer Josephson junction qubits Journal of Materials Science: Materials in Electronics, 12, (4-6), pp. 289-293. (doi:10.1023/A:1011279908265).

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Published date: June 2001


Local EPrints ID: 57550
PURE UUID: 29430d3e-e55b-453d-ad63-05a490ec86fb

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Date deposited: 14 Aug 2008
Last modified: 17 Jul 2017 14:29

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Author: A. Potts
Author: P.R. Routley
Author: G.J. Parker
Author: J.J. Baumberg
Author: P.A.J. de Groot

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