Novel fabrication methods for submicrometer Josephson junction qubits


Potts, A., Routley, P.R., Parker, G.J., Baumberg, J.J. and de Groot, P.A.J. (2001) Novel fabrication methods for submicrometer Josephson junction qubits Journal of Materials Science: Materials in Electronics, 12, (4-6), pp. 289-293. (doi:10.1023/A:1011279908265).

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Description/Abstract

Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al2O3/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks.

Item Type: Article
Digital Object Identifier (DOI): doi:10.1023/A:1011279908265
Subjects:
ePrint ID: 57550
Date :
Date Event
June 2001Published
Date Deposited: 14 Aug 2008
Last Modified: 16 Apr 2017 17:39
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/57550

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