Sager, D.A., Apostolopoulos, V. and Wilkinson, J.S. (2002) Diffusion of neodymium into sputtered films of tantalum pentoxide. Journal of the American Ceramic Society, 85 (10), 2581-2583. (doi:10.1111/j.1151-2916.2002.tb00501.x).
Abstract
In this communication the diffusion of neodymium into rf-sputtered films of tantalum pentoxide (Ta2O5) has been investigated using the SIMS technique. The diffusion characteristics were obtained for a temperature of 1100°C, and the results showed a time-dependent diffusion coefficient that reflects a transition of the sputtered films from the amorphous to the crystalline phase. The potential for doping films of Ta2O5 with neodymium by diffusion, for the realization of novel active optical devices, is also discussed.
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- Faculties (pre 2011 reorg) > Faculty of Engineering Science & Maths (pre 2011 reorg) > Optoelectronics Research Centre (pre 2011 reorg)
Current Faculties > Faculty of Engineering and Physical Sciences > Zepler Institute for Photonics and Nanoelectronics > Optoelectronics Research Centre (pre 2011 reorg)
Zepler Institute for Photonics and Nanoelectronics > Optoelectronics Research Centre (pre 2011 reorg) - Faculties (pre 2011 reorg) > Faculty of Engineering Science & Maths (pre 2011 reorg) > Physics & Astronomy (pre 2011 reorg)
Current Faculties > Faculty of Engineering and Physical Sciences > School of Physics and Astronomy > Physics & Astronomy (pre 2011 reorg)
School of Physics and Astronomy > Physics & Astronomy (pre 2011 reorg)
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