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Electrochemical deposition of polypyrrole on patterned self-assembled monolayers

Li, Xiaohong, Zhang, Xiaogang, Sun, Qiaoyu, Lü, Weigang and Li, Hulin (2000) Electrochemical deposition of polypyrrole on patterned self-assembled monolayers Journal of Electroanalytical Chemistry, 492, (1), pp. 23-30. (doi:10.1016/S0022-0728(00)00248-5).

Record type: Article

Abstract

Patterned self-assembled monolayers have been fabricated by the reductive desorption of mercaptoacetic acid in mixed monolayers of mercaptoacetic acid and C16SH in alkaline solution. The greater the content of C16SH in the monolayers, the more negative is the reductive desorption potential of mercaptoacetic acid, indicating that mercaptoacetic acid and C16SH did not form patched domains, but mixed well with each other. The electrochemical deposition of pyrrole has been investigated at the patterned monolayers by cyclic voltammetry and atomic force microscopy (AFM). The results show that the polymer film growth strongly depends on the integrity of such patterned monolayers. In the case of patterned monolayers of high integrity, the polypyrrole grows on the top of the monolayers. However, in the case of a large number of pinhole defects, the polymerization results in the formation of polymer nuclei on pinhole sites scattered in the insulating monolayer matrix. The nuclei act as conducting paths to make the redox of the electroactive species more facile.

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More information

Published date: 29 September 2000
Keywords: deposition process, growth mechanism, reductive desorption, self-assembled mixed monolayer, defects, polymer
Organisations: Engineering Mats & Surface Engineerg Gp

Identifiers

Local EPrints ID: 63272
URI: http://eprints.soton.ac.uk/id/eprint/63272
ISSN: 1572-6657
PURE UUID: ff8dccbc-3260-45cc-a691-9aef0ce39ec7

Catalogue record

Date deposited: 25 Sep 2008
Last modified: 17 Jul 2017 14:18

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Contributors

Author: Xiaohong Li
Author: Xiaogang Zhang
Author: Qiaoyu Sun
Author: Weigang Lü
Author: Hulin Li

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