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Electrochemical deposition of polypyrrole on patterned self-assembled monolayers

Electrochemical deposition of polypyrrole on patterned self-assembled monolayers
Electrochemical deposition of polypyrrole on patterned self-assembled monolayers
Patterned self-assembled monolayers have been fabricated by the reductive desorption of mercaptoacetic acid in mixed monolayers of mercaptoacetic acid and C16SH in alkaline solution. The greater the content of C16SH in the monolayers, the more negative is the reductive desorption potential of mercaptoacetic acid, indicating that mercaptoacetic acid and C16SH did not form patched domains, but mixed well with each other. The electrochemical deposition of pyrrole has been investigated at the patterned monolayers by cyclic voltammetry and atomic force microscopy (AFM). The results show that the polymer film growth strongly depends on the integrity of such patterned monolayers. In the case of patterned monolayers of high integrity, the polypyrrole grows on the top of the monolayers. However, in the case of a large number of pinhole defects, the polymerization results in the formation of polymer nuclei on pinhole sites scattered in the insulating monolayer matrix. The nuclei act as conducting paths to make the redox of the electroactive species more facile.
deposition process, growth mechanism, reductive desorption, self-assembled mixed monolayer, defects, polymer
1572-6657
23-30
Li, Xiaohong
ea8135d4-1bd7-4771-85cd-eb8f2a264654
Zhang, Xiaogang
08d0856c-5103-427c-902b-fdcfd6933512
Sun, Qiaoyu
053b1973-d7b8-4127-9c79-58924f8767cb
Lü, Weigang
1bedc200-0224-4bae-9b1d-8c0d36fbf620
Li, Hulin
25444e6e-ccd0-4997-a4ec-636914af60e0
Li, Xiaohong
ea8135d4-1bd7-4771-85cd-eb8f2a264654
Zhang, Xiaogang
08d0856c-5103-427c-902b-fdcfd6933512
Sun, Qiaoyu
053b1973-d7b8-4127-9c79-58924f8767cb
Lü, Weigang
1bedc200-0224-4bae-9b1d-8c0d36fbf620
Li, Hulin
25444e6e-ccd0-4997-a4ec-636914af60e0

Li, Xiaohong, Zhang, Xiaogang, Sun, Qiaoyu, Lü, Weigang and Li, Hulin (2000) Electrochemical deposition of polypyrrole on patterned self-assembled monolayers. Journal of Electroanalytical Chemistry, 492 (1), 23-30. (doi:10.1016/S0022-0728(00)00248-5).

Record type: Article

Abstract

Patterned self-assembled monolayers have been fabricated by the reductive desorption of mercaptoacetic acid in mixed monolayers of mercaptoacetic acid and C16SH in alkaline solution. The greater the content of C16SH in the monolayers, the more negative is the reductive desorption potential of mercaptoacetic acid, indicating that mercaptoacetic acid and C16SH did not form patched domains, but mixed well with each other. The electrochemical deposition of pyrrole has been investigated at the patterned monolayers by cyclic voltammetry and atomic force microscopy (AFM). The results show that the polymer film growth strongly depends on the integrity of such patterned monolayers. In the case of patterned monolayers of high integrity, the polypyrrole grows on the top of the monolayers. However, in the case of a large number of pinhole defects, the polymerization results in the formation of polymer nuclei on pinhole sites scattered in the insulating monolayer matrix. The nuclei act as conducting paths to make the redox of the electroactive species more facile.

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More information

Published date: 29 September 2000
Keywords: deposition process, growth mechanism, reductive desorption, self-assembled mixed monolayer, defects, polymer
Organisations: Engineering Mats & Surface Engineerg Gp

Identifiers

Local EPrints ID: 63272
URI: http://eprints.soton.ac.uk/id/eprint/63272
ISSN: 1572-6657
PURE UUID: ff8dccbc-3260-45cc-a691-9aef0ce39ec7

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Date deposited: 25 Sep 2008
Last modified: 15 Mar 2024 11:37

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Contributors

Author: Xiaohong Li
Author: Xiaogang Zhang
Author: Qiaoyu Sun
Author: Weigang Lü
Author: Hulin Li

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