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Structure and mechanical properties of reactive sputtering CrSiN films

Structure and mechanical properties of reactive sputtering CrSiN films
Structure and mechanical properties of reactive sputtering CrSiN films
CrSiN films with various Si contents were deposited by reactive magnetron sputtering using the codeposition of Cr and Si targets in the presence of the reactive gas mixture. Comparative studies on microstructure and mechanical properties between CrN and CrSiN films with various Si contents were carried out. The structure of the CrSiN films was found to change from crystalline to amorphous structure as the Si contents increase. Amorphous phase of Si3N4 compound was suggested to exist in the CrSiN film. The growth of films has been observed from continuous columnar structure, granular structure to glassy-like appearance morphology with the increase of silicon content. The film fracture changed from continuous columnar structure, granular structure to glassy-like appearance morphology with the
increase of silicon content. Two hardness peaks of the films as function of Si contents have been discussed.
CrSiN films, magnetron sputtering, microstructure, mechanical properties
0169-4332
4425-4429
Zhang, Guangan
562918cf-f3df-4647-b855-392f10a1dce6
Wang, Liping
ef5828b8-d874-42db-bb25-713890281af2
Wang, S.C.
8a390e2d-6552-4c7c-a88f-25bf9d6986a6
Yan, Pengxun
c794b743-d0b3-4c1c-b51c-053e7daedb4e
Xue, Qunji
7614cf46-0701-4942-bfcf-3d480aa3537a
Zhang, Guangan
562918cf-f3df-4647-b855-392f10a1dce6
Wang, Liping
ef5828b8-d874-42db-bb25-713890281af2
Wang, S.C.
8a390e2d-6552-4c7c-a88f-25bf9d6986a6
Yan, Pengxun
c794b743-d0b3-4c1c-b51c-053e7daedb4e
Xue, Qunji
7614cf46-0701-4942-bfcf-3d480aa3537a

Zhang, Guangan, Wang, Liping, Wang, S.C., Yan, Pengxun and Xue, Qunji (2009) Structure and mechanical properties of reactive sputtering CrSiN films. Applied Surface Science, 255 (8), 4425-4429. (doi:10.1016/j.apsusc.2008.11.036).

Record type: Article

Abstract

CrSiN films with various Si contents were deposited by reactive magnetron sputtering using the codeposition of Cr and Si targets in the presence of the reactive gas mixture. Comparative studies on microstructure and mechanical properties between CrN and CrSiN films with various Si contents were carried out. The structure of the CrSiN films was found to change from crystalline to amorphous structure as the Si contents increase. Amorphous phase of Si3N4 compound was suggested to exist in the CrSiN film. The growth of films has been observed from continuous columnar structure, granular structure to glassy-like appearance morphology with the increase of silicon content. The film fracture changed from continuous columnar structure, granular structure to glassy-like appearance morphology with the
increase of silicon content. Two hardness peaks of the films as function of Si contents have been discussed.

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Published date: 1 February 2009
Keywords: CrSiN films, magnetron sputtering, microstructure, mechanical properties
Organisations: Engineering Mats & Surface Engineerg Gp

Identifiers

Local EPrints ID: 64847
URI: https://eprints.soton.ac.uk/id/eprint/64847
ISSN: 0169-4332
PURE UUID: f73a1b00-3e0e-4dc1-9733-c8e226229fa1

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Date deposited: 25 Jun 2009
Last modified: 13 Mar 2019 20:20

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