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Structure and mechanical properties of reactive sputtering CrSiN films

Zhang, Guangan, Wang, Liping, Wang, S.C., Yan, Pengxun and Xue, Qunji (2009) Structure and mechanical properties of reactive sputtering CrSiN films Applied Surface Science, 255, (8), pp. 4425-4429. (doi:10.1016/j.apsusc.2008.11.036).

Record type: Article

Abstract

CrSiN films with various Si contents were deposited by reactive magnetron sputtering using the codeposition of Cr and Si targets in the presence of the reactive gas mixture. Comparative studies on microstructure and mechanical properties between CrN and CrSiN films with various Si contents were carried out. The structure of the CrSiN films was found to change from crystalline to amorphous structure as the Si contents increase. Amorphous phase of Si3N4 compound was suggested to exist in the CrSiN film. The growth of films has been observed from continuous columnar structure, granular structure to glassy-like appearance morphology with the increase of silicon content. The film fracture changed from continuous columnar structure, granular structure to glassy-like appearance morphology with the
increase of silicon content. Two hardness peaks of the films as function of Si contents have been discussed.

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Published date: 1 February 2009
Keywords: CrSiN films, magnetron sputtering, microstructure, mechanical properties
Organisations: Engineering Mats & Surface Engineerg Gp

Identifiers

Local EPrints ID: 64847
URI: http://eprints.soton.ac.uk/id/eprint/64847
ISSN: 0169-4332
PURE UUID: f73a1b00-3e0e-4dc1-9733-c8e226229fa1

Catalogue record

Date deposited: 25 Jun 2009
Last modified: 17 Jul 2017 14:11

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Contributors

Author: Guangan Zhang
Author: Liping Wang
Author: S.C. Wang
Author: Pengxun Yan
Author: Qunji Xue

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