Structure and mechanical properties of reactive sputtering CrSiN films


Zhang, Guangan, Wang, Liping, Wang, S.C., Yan, Pengxun and Xue, Qunji (2009) Structure and mechanical properties of reactive sputtering CrSiN films Applied Surface Science, 255, (8), pp. 4425-4429. (doi:10.1016/j.apsusc.2008.11.036).

Download

[img] PDF zhang.pdf - Other
Download (472kB)

Description/Abstract

CrSiN films with various Si contents were deposited by reactive magnetron sputtering using the codeposition of Cr and Si targets in the presence of the reactive gas mixture. Comparative studies on microstructure and mechanical properties between CrN and CrSiN films with various Si contents were carried out. The structure of the CrSiN films was found to change from crystalline to amorphous structure as the Si contents increase. Amorphous phase of Si3N4 compound was suggested to exist in the CrSiN film. The growth of films has been observed from continuous columnar structure, granular structure to glassy-like appearance morphology with the increase of silicon content. The film fracture changed from continuous columnar structure, granular structure to glassy-like appearance morphology with the
increase of silicon content. Two hardness peaks of the films as function of Si contents have been discussed.

Item Type: Article
Digital Object Identifier (DOI): doi:10.1016/j.apsusc.2008.11.036
ISSNs: 0169-4332 (print)
Keywords: CrSiN films, magnetron sputtering, microstructure, mechanical properties
Subjects:

Organisations: Engineering Mats & Surface Engineerg Gp
ePrint ID: 64847
Date :
Date Event
1 February 2009Published
Date Deposited: 25 Jun 2009
Last Modified: 16 Apr 2017 17:18
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/64847

Actions (login required)

View Item View Item