The University of Southampton
University of Southampton Institutional Repository

Fabrication of macroporous polysilicon by nanosphere lithography

Fabrication of macroporous polysilicon by nanosphere lithography
Fabrication of macroporous polysilicon by nanosphere lithography
The fabrication of ordered macroporous silicon is obtained by exploiting the self-assembly properties of polymer nanospheres. Here, we demonstrate the method by using nanospheres of 200nm and 500nm. These self-assemble in monolayers of ordered hexagonal close-packed nanospheres. A controlled reactive ion etch of the assembled nanospheres, subsequent evaporation of metal, followed by 'lift-off' of the polymer nanospheres, provides a mask suitable for a further reactive ion etch step to provide macroporous polysilicon. This methodology provides a novel approach for the fabrication of highly ordered macroporous polysilicon; porous silicon substrates with pores of this size (50nm to 500nm) were previously only fabricated using rather difficult processing methods. The method reported here is straightforward and achieved using fabrication methods that are compatible with those currently used for microelectromechanical systems (MEMS), photonic devices and nanostructured surfaces.
0960-1317
64012
Chau, Chien Fat
b49f2cd5-29a7-4c20-b87e-35600a7a6cfd
Melvin, Tracy
fd87f5eb-2bb9-48fa-b7be-7100ace9c50f
Chau, Chien Fat
b49f2cd5-29a7-4c20-b87e-35600a7a6cfd
Melvin, Tracy
fd87f5eb-2bb9-48fa-b7be-7100ace9c50f

Chau, Chien Fat and Melvin, Tracy (2008) Fabrication of macroporous polysilicon by nanosphere lithography. Journal of Micromechanics and Microengineering, 18, 64012. (doi:10.1088/0960-1317/18/6/064012).

Record type: Article

Abstract

The fabrication of ordered macroporous silicon is obtained by exploiting the self-assembly properties of polymer nanospheres. Here, we demonstrate the method by using nanospheres of 200nm and 500nm. These self-assemble in monolayers of ordered hexagonal close-packed nanospheres. A controlled reactive ion etch of the assembled nanospheres, subsequent evaporation of metal, followed by 'lift-off' of the polymer nanospheres, provides a mask suitable for a further reactive ion etch step to provide macroporous polysilicon. This methodology provides a novel approach for the fabrication of highly ordered macroporous polysilicon; porous silicon substrates with pores of this size (50nm to 500nm) were previously only fabricated using rather difficult processing methods. The method reported here is straightforward and achieved using fabrication methods that are compatible with those currently used for microelectromechanical systems (MEMS), photonic devices and nanostructured surfaces.

PDF
e.pdf - Version of Record
Restricted to Repository staff only
Request a copy

More information

Published date: 15 May 2008

Identifiers

Local EPrints ID: 65482
URI: https://eprints.soton.ac.uk/id/eprint/65482
ISSN: 0960-1317
PURE UUID: dcefdee1-d68c-431c-bbdd-6cc93f0ec855

Catalogue record

Date deposited: 17 Feb 2009
Last modified: 24 Jul 2017 16:43

Export record

Altmetrics

Contributors

Author: Chien Fat Chau
Author: Tracy Melvin

University divisions

Download statistics

Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.

View more statistics

Atom RSS 1.0 RSS 2.0

Contact ePrints Soton: eprints@soton.ac.uk

ePrints Soton supports OAI 2.0 with a base URL of https://eprints.soton.ac.uk/cgi/oai2

This repository has been built using EPrints software, developed at the University of Southampton, but available to everyone to use.

We use cookies to ensure that we give you the best experience on our website. If you continue without changing your settings, we will assume that you are happy to receive cookies on the University of Southampton website.

×