Mailis, S., Sones, C.L. and Eason, R.W. (2008) Micro-structuring and ferroelectric domain engineering of single crystal lithium niobate. In, Ferraro, Pietro, Grilli, Simonetta and De Natale, Paolo (eds.) Ferroelectric Crystals for Photonic Applications: Including Nanoscale Fabrication and Characterization Techniques. (Springer Series in Materials Science, 91, part 1) Berlin, Germany. Springer, pp. 3-18. (doi:10.1007/978-3-540-77965-0_1).
Abstract
The ability to microstructure specific materials is always associated with the ability to selectively remove material over small scale-lengths. Localized etching whether it is chemical or physical, wet or dry, parallel or sequential is central to every modern microstructuring method. For example a beam of accelerated ions is scanned on the surface of interest removing material along its trajectory. Alternatively the surface is prepared/treated in a manner that changes its "quality" locally making it more susceptible or more resistive to a particular etching agent. The whole surface is subsequently exposed to the etching agent which can be a uniform accelerated ion beam, a laser beam or an acid. The etching agent preferentially attacks the pre-treated (or the untreated) portion of the surface removing material. However, before embarking into the description of differential chemical etching of domain-engineered structures we present other methods that have been used for the microstructuring of lithium niobate. The methods listed here have been developed for the microelectronics industry hence they are considered standard and are very well characterized.
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