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Fabrication of reflective volume gratings in pulsed-laser-deposition Ti:sapphire waveguides with UV femtosecond-laser pulses

Fabrication of reflective volume gratings in pulsed-laser-deposition Ti:sapphire waveguides with UV femtosecond-laser pulses
Fabrication of reflective volume gratings in pulsed-laser-deposition Ti:sapphire waveguides with UV femtosecond-laser pulses
Highly reflective volume Bragg gratings (R~80%) were written in Ti:sapphire planar and channel waveguides fabricated via pulsed-laser deposition (PLD) by exposure to UV (266 nm) femtosecond laser irradiation through suitable phase masks. Large photo-induced refractive index modulations of up to ~1×10-2 ions were observed, which were completely reversible at temperatures of ∼100°C. The dependence of the refractive index modulation on intensity suggests that the mechanism for grating inscription is an one-photon absorption process. Generation of gratings may result from a charge transfer process between the Ti3+ and Ti4+ ions and/or transient localized structural re-arrangements.
0947-8396
219-223
Grivas, C.
7f564818-0ac0-4127-82a7-22e87ac35f1a
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Grivas, C.
7f564818-0ac0-4127-82a7-22e87ac35f1a
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020

Grivas, C. and Eason, R.W. (2008) Fabrication of reflective volume gratings in pulsed-laser-deposition Ti:sapphire waveguides with UV femtosecond-laser pulses. Applied Physics A: Materials Science & Processing, 93 (1), 219-223. (doi:10.1007/s00339-008-4673-1).

Record type: Article

Abstract

Highly reflective volume Bragg gratings (R~80%) were written in Ti:sapphire planar and channel waveguides fabricated via pulsed-laser deposition (PLD) by exposure to UV (266 nm) femtosecond laser irradiation through suitable phase masks. Large photo-induced refractive index modulations of up to ~1×10-2 ions were observed, which were completely reversible at temperatures of ∼100°C. The dependence of the refractive index modulation on intensity suggests that the mechanism for grating inscription is an one-photon absorption process. Generation of gratings may result from a charge transfer process between the Ti3+ and Ti4+ ions and/or transient localized structural re-arrangements.

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Published date: October 2008

Identifiers

Local EPrints ID: 65793
URI: http://eprints.soton.ac.uk/id/eprint/65793
ISSN: 0947-8396
PURE UUID: c9d42fad-5ebf-422f-a725-ab246f56eb72
ORCID for R.W. Eason: ORCID iD orcid.org/0000-0001-9704-2204

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Date deposited: 23 Mar 2009
Last modified: 15 Jun 2021 01:33

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