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Femtosecond laser-induced solid etching (LISE) of silicon and silica

Femtosecond laser-induced solid etching (LISE) of silicon and silica
Femtosecond laser-induced solid etching (LISE) of silicon and silica
We present a novel, laser-based microstructuring technique for the etching and deposition of solid materials. This technique, which we call laser-induced solid etching (LISE), utilises the absorption of femtosecond duration laser pulses in a constrained metal film between two bulk substrates, at least one of which is transparent to the laser wavelength. The very rapid pressure increase in the metal film following irradiation is believed to initiate crack-propagation in one or other of the bulk substrates. By spatially shaping the laser beam, the cracking process can be controlled to etch solid chunks of material from the substrates. Using LISE we have etched smooth, micron-scale pits and trenches in silicon and silica. The results will be compared to etched features produced using conventional techniques.A unique feature of LISE is that the material etched from the bulk substrate is removed as a single solid piece and is not shattered, melted, or vaporised by the process. Hence, the etched material can be collected on the other bulk substrate used in the process. In this way, we have deposited micron-scale dots and lines of silica onto silicon and visa-versa. The deposited structures obtained using LISE compare well with those obtained with conventional laser forward transfer techniques. Minimal evidence of melting during the process has been observed, suggesting that LISE may be a useful technique for the forward transfer direct-write of intact solid materials
Banks, D.P.
134b4e3e-9c17-4155-a3e6-bd16d5f94be4
Kaur, K.S.
fe008163-e435-41c1-9131-3d4571fb5cf5
Grivas, C.
7f564818-0ac0-4127-82a7-22e87ac35f1a
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Banks, D.P.
134b4e3e-9c17-4155-a3e6-bd16d5f94be4
Kaur, K.S.
fe008163-e435-41c1-9131-3d4571fb5cf5
Grivas, C.
7f564818-0ac0-4127-82a7-22e87ac35f1a
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020

Banks, D.P., Kaur, K.S., Grivas, C. and Eason, R.W. (2009) Femtosecond laser-induced solid etching (LISE) of silicon and silica. EMRS Spring Meeting. 08 - 12 Jun 2009.

Record type: Conference or Workshop Item (Paper)

Abstract

We present a novel, laser-based microstructuring technique for the etching and deposition of solid materials. This technique, which we call laser-induced solid etching (LISE), utilises the absorption of femtosecond duration laser pulses in a constrained metal film between two bulk substrates, at least one of which is transparent to the laser wavelength. The very rapid pressure increase in the metal film following irradiation is believed to initiate crack-propagation in one or other of the bulk substrates. By spatially shaping the laser beam, the cracking process can be controlled to etch solid chunks of material from the substrates. Using LISE we have etched smooth, micron-scale pits and trenches in silicon and silica. The results will be compared to etched features produced using conventional techniques.A unique feature of LISE is that the material etched from the bulk substrate is removed as a single solid piece and is not shattered, melted, or vaporised by the process. Hence, the etched material can be collected on the other bulk substrate used in the process. In this way, we have deposited micron-scale dots and lines of silica onto silicon and visa-versa. The deposited structures obtained using LISE compare well with those obtained with conventional laser forward transfer techniques. Minimal evidence of melting during the process has been observed, suggesting that LISE may be a useful technique for the forward transfer direct-write of intact solid materials

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More information

Published date: 2009
Venue - Dates: EMRS Spring Meeting, 2009-06-08 - 2009-06-12

Identifiers

Local EPrints ID: 70907
URI: https://eprints.soton.ac.uk/id/eprint/70907
PURE UUID: ca3d6ed5-c110-4f08-b6f0-69907d48315c
ORCID for R.W. Eason: ORCID iD orcid.org/0000-0001-9704-2204

Catalogue record

Date deposited: 10 Mar 2010
Last modified: 06 Jun 2018 13:13

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