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Electron beam lithography for high density meta fish scale operational at optical frequency

Electron beam lithography for high density meta fish scale operational at optical frequency
Electron beam lithography for high density meta fish scale operational at optical frequency
This paper reports our recent progress in electron beam lithography for high resolution and highly dense metallic structures such as fish scale on both silicon and quartz. To observe photonic property in optical frequency, the pitch of 500 nm with both linewidth and gap of 50 nm gap in Al is demanded. For reliable lift-off process, adequate undercut in bilayer layer of resists is essential. Three different bilayers, PMMA/LOR, PMMA/copolymer and PMMA/PMMA (with different molecular weights) were compared and the most suitable bilayer was found to be the PMMA/PMMA with a difference in molecular weight between the top and bottom layer. With such a bilayer stack, dense fish scale pattern with minimum linewidth of 50 nm in Al were fabricated for both transparent and reflective configurations. Astonishing optical properties such as magnetic wall and asymmetric propagating waves through the chiral fish scale were observed.
0167-9317
1081-1084
Chen, Yifang
fb868aa4-ecb4-4203-a0a8-88c2195a2bae
Schwanecke, Alexander S.
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Fedotov, V.A.
3725f5cc-2d0b-4e61-95c5-26d187c84f25
Khardikov, V.V.
01d600d3-32d0-495f-a4bb-8e966e5f6ec4
Mladyonov, P.L.
eb060f33-20dc-4a62-9698-1ea0b9e9f548
Prosvirnin, S.L.
a12695af-60fb-46bd-a711-032547ce8167
Rogacheva, A.V.
07e3c6ce-4e4d-4660-87fd-b04e7061b3ee
Zheludev, Nikolay I.
32fb6af7-97e4-4d11-bca6-805745e40cc6
Huq, Ejaz
6ba52b03-395d-4361-96b0-5f0d9d7eb746
Chen, Yifang
fb868aa4-ecb4-4203-a0a8-88c2195a2bae
Schwanecke, Alexander S.
2f6c06ac-00e6-4e9f-ae02-ba851d99e7f5
Fedotov, V.A.
3725f5cc-2d0b-4e61-95c5-26d187c84f25
Khardikov, V.V.
01d600d3-32d0-495f-a4bb-8e966e5f6ec4
Mladyonov, P.L.
eb060f33-20dc-4a62-9698-1ea0b9e9f548
Prosvirnin, S.L.
a12695af-60fb-46bd-a711-032547ce8167
Rogacheva, A.V.
07e3c6ce-4e4d-4660-87fd-b04e7061b3ee
Zheludev, Nikolay I.
32fb6af7-97e4-4d11-bca6-805745e40cc6
Huq, Ejaz
6ba52b03-395d-4361-96b0-5f0d9d7eb746

Chen, Yifang, Schwanecke, Alexander S., Fedotov, V.A., Khardikov, V.V., Mladyonov, P.L., Prosvirnin, S.L., Rogacheva, A.V., Zheludev, Nikolay I. and Huq, Ejaz (2009) Electron beam lithography for high density meta fish scale operational at optical frequency. Microelectronic Engineering, 86, 1081-1084. (doi:10.1016/j.mee.2008.11.094).

Record type: Article

Abstract

This paper reports our recent progress in electron beam lithography for high resolution and highly dense metallic structures such as fish scale on both silicon and quartz. To observe photonic property in optical frequency, the pitch of 500 nm with both linewidth and gap of 50 nm gap in Al is demanded. For reliable lift-off process, adequate undercut in bilayer layer of resists is essential. Three different bilayers, PMMA/LOR, PMMA/copolymer and PMMA/PMMA (with different molecular weights) were compared and the most suitable bilayer was found to be the PMMA/PMMA with a difference in molecular weight between the top and bottom layer. With such a bilayer stack, dense fish scale pattern with minimum linewidth of 50 nm in Al were fabricated for both transparent and reflective configurations. Astonishing optical properties such as magnetic wall and asymmetric propagating waves through the chiral fish scale were observed.

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Published date: 2009

Identifiers

Local EPrints ID: 70922
URI: https://eprints.soton.ac.uk/id/eprint/70922
ISSN: 0167-9317
PURE UUID: 08188788-0121-4b48-9805-617936ed7b36
ORCID for Nikolay I. Zheludev: ORCID iD orcid.org/0000-0002-1013-6636

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Date deposited: 10 Mar 2010
Last modified: 20 Jul 2019 01:22

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