Nano metamaterials and photonic gratings by nanoimprint and hot embossing
Chen, Yifang, Wang, Xudi, Banu, S., Schwanecke, A.S., Morgan, H. and Zheludev, N.I. (2006) Nano metamaterials and photonic gratings by nanoimprint and hot embossing In, International Symposium on Biophotonics, Nanophotonics and Metamaterials, 2006. Metamaterials 2006. International Symposium on Biophotonics, Nanophotonics and Metamaterials IEEE pp. 420-425. (doi:10.1109/METAMAT.2006.334938).
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This paper reviews our recent progress in nanoimprint lithography and hot embossing for the fabrications of planar photonic meta-materials and photonic gratings. With these technologies, dielectric, metallic chiral structures and dense gratings in sizes from sub micrometres down to sub-100 nm were successfully fabricated. Characterisations of these meta-materials and photonic structures indicate these materials and structures are functional. It can be concluded that nanoimporint lithography and hot embossing are capable of achieving large area planar optic meta-materials and photonic structures such as dense gratings. This progress suggests the great prospect of these techniques for fast speed patterning of important meta materials and photonic nanostructures with high throughput at low cost in mass production in the future.
|Item Type:||Book Section|
|Digital Object Identifier (DOI):||doi:10.1109/METAMAT.2006.334938|
|Venue - Dates:||International Symposium on Biophotonics, Nanophotonics and Metamaterials, China, 2006-10-16 - 2006-10-18
|Date Deposited:||11 Dec 2009|
|Last Modified:||18 Apr 2017 21:06|
|Further Information:||Google Scholar|
|RDF:||RDF+N-Triples, RDF+N3, RDF+XML, Browse.|
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