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Nano metamaterials and photonic gratings by nanoimprint and hot embossing

Chen, Yifang, Wang, Xudi, Banu, S., Schwanecke, A.S., Morgan, H. and Zheludev, N.I. (2006) Nano metamaterials and photonic gratings by nanoimprint and hot embossing In, International Symposium on Biophotonics, Nanophotonics and Metamaterials, 2006. Metamaterials 2006. International Symposium on Biophotonics, Nanophotonics and Metamaterials IEEE pp. 420-425. (doi:10.1109/METAMAT.2006.334938).

Record type: Book Section

Abstract

This paper reviews our recent progress in nanoimprint lithography and hot embossing for the fabrications of planar photonic meta-materials and photonic gratings. With these technologies, dielectric, metallic chiral structures and dense gratings in sizes from sub micrometres down to sub-100 nm were successfully fabricated. Characterisations of these meta-materials and photonic structures indicate these materials and structures are functional. It can be concluded that nanoimporint lithography and hot embossing are capable of achieving large area planar optic meta-materials and photonic structures such as dense gratings. This progress suggests the great prospect of these techniques for fast speed patterning of important meta materials and photonic nanostructures with high throughput at low cost in mass production in the future.

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Published date: October 2006
Venue - Dates: International Symposium on Biophotonics, Nanophotonics and Metamaterials, China, 2006-10-16 - 2006-10-18

Identifiers

Local EPrints ID: 70958
URI: http://eprints.soton.ac.uk/id/eprint/70958
ISBN: 0780397738
PURE UUID: 9d6ffe75-b10c-4330-b02d-98079bd82731

Catalogue record

Date deposited: 11 Dec 2009
Last modified: 19 Jul 2017 00:02

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Contributors

Author: Yifang Chen
Author: Xudi Wang
Author: S. Banu
Author: A.S. Schwanecke
Author: H. Morgan
Author: N.I. Zheludev

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