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Nanoimprint and soft lithography for planar photonic meta-materials

Nanoimprint and soft lithography for planar photonic meta-materials
Nanoimprint and soft lithography for planar photonic meta-materials
This paper proposes to apply nanoimprint and soft lithography to the manufacture of large area planar chiral photonic meta-materials. Both dielectric and metallic chiral structures in nanometre order were replicated by nanoimprint lithography (NIL). To carry out the NIL, a nanofabrication process for imprint templates with chiral features was developed. For the dielectric chiral structures, a single layer of thick hydrogen silsequioxane (HSQ) was used, and for metallic chiral ones a bi-layer PMMA/HSQ technique was employed. The polarization conversion capabilities of planar chiral structures (PCS) imprinted in dielectric materials have been experimentally observed. This indicates that the developed nanoimprint processes in this work have the prospect of manufacturing planar photonic meta-media in high volume at low cost. A hybrid lithography combing nanoimprint and soft lithography is proposed for the constructions of chiral cavities inside dielectric materials
Chen, Y.
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Tao, J.
201b6dbd-62c8-4d1b-aee7-15da60b66fe3
Zhao, X.
c32d0dd5-3ac6-4c9c-b41e-95baa08c7472
Cui, Z.
e27b8507-178b-4be8-bd63-f1c91d73c69b
Schwanecke, A.S.
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Zheludev, N.I.
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Szoplik, Tomasz
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Ozbay, Ekmel
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Soukoulis, Costas M.
0de2cf0a-fdf2-4f08-898a-459004a5656b
Zheludev, Nikolay I.
32fb6af7-97e4-4d11-bca6-805745e40cc6
Chen, Y.
aa3aa967-2aa4-499c-9265-8e6a7e7fb9e5
Tao, J.
201b6dbd-62c8-4d1b-aee7-15da60b66fe3
Zhao, X.
c32d0dd5-3ac6-4c9c-b41e-95baa08c7472
Cui, Z.
e27b8507-178b-4be8-bd63-f1c91d73c69b
Schwanecke, A.S.
ee362335-ee3e-4c26-8035-5c397e10b274
Zheludev, N.I.
32fb6af7-97e4-4d11-bca6-805745e40cc6
Szoplik, Tomasz
1be4c42b-7af0-4f73-8c5f-3d208e706e05
Ozbay, Ekmel
110fe237-4e15-4eed-acbb-aa17f6806a3b
Soukoulis, Costas M.
0de2cf0a-fdf2-4f08-898a-459004a5656b
Zheludev, Nikolay I.
32fb6af7-97e4-4d11-bca6-805745e40cc6

Chen, Y., Tao, J., Zhao, X., Cui, Z., Schwanecke, A.S. and Zheludev, N.I. (2005) Nanoimprint and soft lithography for planar photonic meta-materials. Szoplik, Tomasz, Ozbay, Ekmel, Soukoulis, Costas M. and Zheludev, Nikolay I. (eds.) SPIE 5955 : Metamaterials, Poland. 28 Aug - 27 Sep 2005. 8 pp . (doi:10.1117/12.620446).

Record type: Conference or Workshop Item (Paper)

Abstract

This paper proposes to apply nanoimprint and soft lithography to the manufacture of large area planar chiral photonic meta-materials. Both dielectric and metallic chiral structures in nanometre order were replicated by nanoimprint lithography (NIL). To carry out the NIL, a nanofabrication process for imprint templates with chiral features was developed. For the dielectric chiral structures, a single layer of thick hydrogen silsequioxane (HSQ) was used, and for metallic chiral ones a bi-layer PMMA/HSQ technique was employed. The polarization conversion capabilities of planar chiral structures (PCS) imprinted in dielectric materials have been experimentally observed. This indicates that the developed nanoimprint processes in this work have the prospect of manufacturing planar photonic meta-media in high volume at low cost. A hybrid lithography combing nanoimprint and soft lithography is proposed for the constructions of chiral cavities inside dielectric materials

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More information

e-pub ahead of print date: 2005
Venue - Dates: SPIE 5955 : Metamaterials, Poland, 2005-08-28 - 2005-09-27

Identifiers

Local EPrints ID: 70996
URI: https://eprints.soton.ac.uk/id/eprint/70996
PURE UUID: 86b6b502-3915-4832-b87d-bac0bc8ce287
ORCID for N.I. Zheludev: ORCID iD orcid.org/0000-0002-1013-6636
ORCID for Nikolay I. Zheludev: ORCID iD orcid.org/0000-0002-1013-6636

Catalogue record

Date deposited: 11 Dec 2009
Last modified: 06 Jun 2018 13:09

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