Nanoimprint lithography for planar chiral photonic meta-materials
Nanoimprint lithography for planar chiral photonic meta-materials
Room temperature nanoimprint lithography has successfully been applied to the fabrication of planar chiral photonic meta-materials. For dielectric chiral structures a single layer of thick HSQ was used while for metallic chiral structures a bi-layer technique using PMMA/hydrogen silsequioxane (HSQ) was applied. The polarization conversion capabilities of planar chiral structures imprinted in dielectric materials have experimentally been observed. This indicates that the developed processes in this work have the prospect of manufacturing planar photonic meta media in high volume at low cost.
Chen, Yifang
fb868aa4-ecb4-4203-a0a8-88c2195a2bae
Tao, J.
201b6dbd-62c8-4d1b-aee7-15da60b66fe3
Schwanecke, A.S.
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Zheludev, N.I.
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Zhao, X.
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Cui, Z.
e27b8507-178b-4be8-bd63-f1c91d73c69b
September 2004
Chen, Yifang
fb868aa4-ecb4-4203-a0a8-88c2195a2bae
Tao, J.
201b6dbd-62c8-4d1b-aee7-15da60b66fe3
Schwanecke, A.S.
ad932518-69e9-4b00-aa55-5467ed784ed7
Zheludev, N.I.
32fb6af7-97e4-4d11-bca6-805745e40cc6
Zhao, X.
c32d0dd5-3ac6-4c9c-b41e-95baa08c7472
Cui, Z.
e27b8507-178b-4be8-bd63-f1c91d73c69b
Chen, Yifang, Tao, J., Schwanecke, A.S., Zheludev, N.I., Zhao, X. and Cui, Z.
(2004)
Nanoimprint lithography for planar chiral photonic meta-materials.
Micro- and Nano-Engineering International Conference 2004 (MNE 2004), Rotterdam, Netherlands.
19 - 21 Sep 2004.
Record type:
Conference or Workshop Item
(Paper)
Abstract
Room temperature nanoimprint lithography has successfully been applied to the fabrication of planar chiral photonic meta-materials. For dielectric chiral structures a single layer of thick HSQ was used while for metallic chiral structures a bi-layer technique using PMMA/hydrogen silsequioxane (HSQ) was applied. The polarization conversion capabilities of planar chiral structures imprinted in dielectric materials have experimentally been observed. This indicates that the developed processes in this work have the prospect of manufacturing planar photonic meta media in high volume at low cost.
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Published date: September 2004
Venue - Dates:
Micro- and Nano-Engineering International Conference 2004 (MNE 2004), Rotterdam, Netherlands, 2004-09-19 - 2004-09-21
Identifiers
Local EPrints ID: 71018
URI: http://eprints.soton.ac.uk/id/eprint/71018
PURE UUID: 27ff1f17-5230-4a50-a4a6-54cfa03fb44b
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Date deposited: 11 Dec 2009
Last modified: 11 Dec 2021 02:56
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Contributors
Author:
Yifang Chen
Author:
J. Tao
Author:
A.S. Schwanecke
Author:
X. Zhao
Author:
Z. Cui
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