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Lithography-free fabrication of high index contrast extreme aspect ratio semiconductor structures

Fang, H., Won, D.J., Sharan, A., Scheidemantel, T.J., Jackson, B., Baril, N.F., Badding, J.V., Gopalan, V., Amezcua, A. and Sazio, P.J.A. (2004) Lithography-free fabrication of high index contrast extreme aspect ratio semiconductor structures At Materials Research Society Fall Meeting, United Kingdom. 29 Nov - 03 Dec 2004.

Record type: Conference or Workshop Item (Paper)

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Published date: 2004
Venue - Dates: Materials Research Society Fall Meeting, United Kingdom, 2004-11-29 - 2004-12-03

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Local EPrints ID: 76435
URI: http://eprints.soton.ac.uk/id/eprint/76435
PURE UUID: 523eb49d-6290-411e-bf37-b2bb5f56b753
ORCID for P.J.A. Sazio: ORCID iD orcid.org/0000-0002-6506-9266

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Date deposited: 11 Mar 2010
Last modified: 18 Jul 2017 23:40

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Contributors

Author: H. Fang
Author: D.J. Won
Author: A. Sharan
Author: T.J. Scheidemantel
Author: B. Jackson
Author: N.F. Baril
Author: J.V. Badding
Author: V. Gopalan
Author: A. Amezcua
Author: P.J.A. Sazio ORCID iD

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