Lithography-free fabrication of high index contrast extreme aspect ratio semiconductor structures


Fang, H., Won, D.J., Sharan, A., Scheidemantel, T.J., Jackson, B., Baril, N.F., Badding, J.V., Gopalan, V., Amezcua, A. and Sazio, P.J.A. (2004) Lithography-free fabrication of high index contrast extreme aspect ratio semiconductor structures At Materials Research Society Fall Meeting, United Kingdom. 29 Nov - 03 Dec 2004.

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Item Type: Conference or Workshop Item (Paper)
Venue - Dates: Materials Research Society Fall Meeting, United Kingdom, 2004-11-29 - 2004-12-03
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ePrint ID: 76435
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2004Published
Date Deposited: 11 Mar 2010
Last Modified: 18 Apr 2017 20:40
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/76435

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