Fang, H., Won, D.J., Sharan, A., Scheidemantel, T.J., Jackson, B., Baril, N.F., Badding, J.V., Gopalan, V., Amezcua, A. and Sazio, P.J.A. (2004) Lithography-free fabrication of high index contrast extreme aspect ratio semiconductor structures. Materials Research Society Fall Meeting, Boston, United Kingdom. 29 Nov - 03 Dec 2004.
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Published date: 2004
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Materials Research Society Fall Meeting, Boston, United Kingdom, 2004-11-29 - 2004-12-03
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Local EPrints ID: 76435
URI: http://eprints.soton.ac.uk/id/eprint/76435
PURE UUID: 523eb49d-6290-411e-bf37-b2bb5f56b753
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Date deposited: 11 Mar 2010
Last modified: 11 Dec 2021 03:46
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Contributors
Author:
H. Fang
Author:
D.J. Won
Author:
A. Sharan
Author:
T.J. Scheidemantel
Author:
B. Jackson
Author:
N.F. Baril
Author:
J.V. Badding
Author:
V. Gopalan
Author:
A. Amezcua
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