High pressure fabrication of extreme aspect ratio semiconductor micro and nanostructures
High pressure fabrication of extreme aspect ratio semiconductor micro and nanostructures
Badding, J.V.
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Sazio, P.J.A.
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Scheidemantel, T.J.
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Baril, N.F.
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Gopalan, V.
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Won, D.J.
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2004
Badding, J.V.
940f7adb-73df-4f8a-9c46-e47f5425fef0
Sazio, P.J.A.
0d6200b5-9947-469a-8e97-9147da8a7158
Scheidemantel, T.J.
bcb05e6c-1d75-44a5-92b0-f75d9d6b60e2
Baril, N.F.
f5d317cc-48d8-4be0-8f08-5385e700f8bb
Gopalan, V.
7927bd73-45f5-4501-a160-d294652c3fe0
Won, D.J.
9191730f-7ebd-42a8-ba63-1f554b3bc824
Badding, J.V., Sazio, P.J.A., Scheidemantel, T.J., Baril, N.F., Gopalan, V. and Won, D.J.
(2004)
High pressure fabrication of extreme aspect ratio semiconductor micro and nanostructures.
Materials Research Society Fall Meeting, Boston, United Kingdom.
29 Nov - 03 Dec 2004.
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Conference or Workshop Item
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Published date: 2004
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Invited paper
Venue - Dates:
Materials Research Society Fall Meeting, Boston, United Kingdom, 2004-11-29 - 2004-12-03
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Local EPrints ID: 76436
URI: http://eprints.soton.ac.uk/id/eprint/76436
PURE UUID: 940c625e-fff9-43a7-8f56-a7e88968d447
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Date deposited: 11 Mar 2010
Last modified: 11 Dec 2021 03:46
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Contributors
Author:
J.V. Badding
Author:
T.J. Scheidemantel
Author:
N.F. Baril
Author:
V. Gopalan
Author:
D.J. Won
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