High pressure fabrication of extreme aspect ratio semiconductor micro and nanostructures


Badding, J.V., Sazio, P.J.A., Scheidemantel, T.J., Baril, N.F., Gopalan, V. and Won, D.J. (2004) High pressure fabrication of extreme aspect ratio semiconductor micro and nanostructures At Materials Research Society Fall Meeting, United Kingdom. 29 Nov - 03 Dec 2004.

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Item Type: Conference or Workshop Item (Paper)
Additional Information: Invited paper
Venue - Dates: Materials Research Society Fall Meeting, United Kingdom, 2004-11-29 - 2004-12-03
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ePrint ID: 76436
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2004Published
Date Deposited: 11 Mar 2010
Last Modified: 18 Apr 2017 20:40
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/76436

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