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UV inscription of sub-micron periodic structures in "hard" optical materials and waveguides

UV inscription of sub-micron periodic structures in "hard" optical materials and waveguides
UV inscription of sub-micron periodic structures in "hard" optical materials and waveguides
Interferometric ablation and structural modification of materials using pulsed UV lasers is a powerful technique for the straightforward fabrication of relief structures in "hard" optical materials such as glasses and thin polycrystalline films. In this approach, a high intensity periodic UV radiation pattern, generated using two- or multi-beam interference, directly ablates the exposed material or induces structural modification in the irradiated volume. In the case of volume structural modification, a further step of development by selective chemical etching may employed to reveal the periodic relief pattern. The selectivity between ablation and volume structural modification is controlled by adjusting the exposure energy density and the number of pulses according to the specific material. Selected results in direct and chemically-assisted interferometric ablation patterning of 1D relief Bragg reflectors in thin oxide films and overlaid waveguides are presented and discussed. Characteristics of the inscription process related to material damage, optical loss, stitching errors and strength irregularities and their correlation to the spectral properties of the waveguide gratings are addressed.
0-7803-8343-5
Pissadakis, S.
a91c54e0-3b8d-479f-b44e-e678bc34a277
Zervas, M.N.
1840a474-dd50-4a55-ab74-6f086aa3f701
Reekie, L.
ec314137-6924-44ad-86a4-ff3f9a67c1b5
Pissadakis, S.
a91c54e0-3b8d-479f-b44e-e678bc34a277
Zervas, M.N.
1840a474-dd50-4a55-ab74-6f086aa3f701
Reekie, L.
ec314137-6924-44ad-86a4-ff3f9a67c1b5

Pissadakis, S., Zervas, M.N. and Reekie, L. (2004) UV inscription of sub-micron periodic structures in "hard" optical materials and waveguides. 6th International Conference on Transparent Optical Networks (ICTON 2004), Wroclaw, Poland. 03 - 07 Jul 2004. 4 pp . (doi:10.1109/ICTON.2004.1360302).

Record type: Conference or Workshop Item (Paper)

Abstract

Interferometric ablation and structural modification of materials using pulsed UV lasers is a powerful technique for the straightforward fabrication of relief structures in "hard" optical materials such as glasses and thin polycrystalline films. In this approach, a high intensity periodic UV radiation pattern, generated using two- or multi-beam interference, directly ablates the exposed material or induces structural modification in the irradiated volume. In the case of volume structural modification, a further step of development by selective chemical etching may employed to reveal the periodic relief pattern. The selectivity between ablation and volume structural modification is controlled by adjusting the exposure energy density and the number of pulses according to the specific material. Selected results in direct and chemically-assisted interferometric ablation patterning of 1D relief Bragg reflectors in thin oxide films and overlaid waveguides are presented and discussed. Characteristics of the inscription process related to material damage, optical loss, stitching errors and strength irregularities and their correlation to the spectral properties of the waveguide gratings are addressed.

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More information

e-pub ahead of print date: 2004
Venue - Dates: 6th International Conference on Transparent Optical Networks (ICTON 2004), Wroclaw, Poland, 2004-07-03 - 2004-07-07

Identifiers

Local EPrints ID: 76437
URI: http://eprints.soton.ac.uk/id/eprint/76437
ISBN: 0-7803-8343-5
PURE UUID: d622cb16-803c-446f-a85b-c5559f866c3b
ORCID for M.N. Zervas: ORCID iD orcid.org/0000-0002-0651-4059

Catalogue record

Date deposited: 11 Mar 2010
Last modified: 18 Feb 2021 16:39

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