Barry, I.E., Eason, R.W. and Cook, Gary (1999) Light induced frustration of etching in Fe doped LiNbO3. In Lasers and Electro-Optics 1999. IEEE. pp. 384-385 . (doi:10.1109/CLEO.1999.834342).
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Conference or Workshop Item
(Paper)
Abstract
We report frustration of normal etching in iron doped lithium niobate by incident 488nm light. At intensities > 1 Wcm-2 etching is fully suppressed. We report the techniques' resolution and the effect of applied electric fields
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Published date: 1999
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Venue - Dates:
Conference on Lasers and Electro-Optics (CLEO '99), Baltimore, United States, 1999-05-23 - 1999-05-28
Identifiers
Local EPrints ID: 76570
URI: http://eprints.soton.ac.uk/id/eprint/76570
ISBN: 1-55752-595-1
PURE UUID: 4e1c9c06-6287-4519-aa9b-951f62f2b2ea
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Date deposited: 11 Mar 2010
Last modified: 14 Mar 2024 02:33
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Author:
I.E. Barry
Author:
R.W. Eason
Author:
Gary Cook
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