Light induced frustration of etching in Fe doped LiNbO3


Barry, I.E., Eason, R.W. and Cook, G. (1999) Light induced frustration of etching in Fe doped LiNbO3 In, Lasers and Electro-Optics 1999. Conference on Lasers and Electro-Optics (CLEO '99) Piscataway, United States, Institute of Electrical and Electronics Engineers pp. 384-385. (doi:10.1109/CLEO.1999.834342).

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Description/Abstract

We report frustration of normal etching in iron doped lithium niobate by incident 488nm light. At intensities > 1 Wcm etching is fully suppressed. We report the techniques' resolution and the effect of applied electric fields

Item Type: Book Section
Digital Object Identifier (DOI): doi:10.1109/CLEO.1999.834342
Additional Information: ,
ISBNs: 1557525951 (print)
Venue - Dates: Conference on Lasers and Electro-Optics (CLEO '99), United States, 1999-05-23 - 1999-05-28
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ePrint ID: 76570
Date :
Date Event
1999Published
Date Deposited: 11 Mar 2010
Last Modified: 18 Apr 2017 20:39
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/76570

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