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Light induced frustration of etching in Fe doped LiNbO3

Record type: Book Section

We report frustration of normal etching in iron doped lithium niobate by incident 488nm light. At intensities > 1 Wcm etching is fully suppressed. We report the techniques' resolution and the effect of applied electric fields

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Citation

Barry, I.E., Eason, R.W. and Cook, G. (1999) Light induced frustration of etching in Fe doped LiNbO3 In, Lasers and Electro-Optics 1999. Conference on Lasers and Electro-Optics (CLEO '99) Piscataway, United States, Institute of Electrical and Electronics Engineers pp. 384-385. (doi:10.1109/CLEO.1999.834342).

More information

Published date: 1999
Additional Information: ,
Venue - Dates: Conference on Lasers and Electro-Optics (CLEO '99), United States, 1999-05-23 - 1999-05-28

Identifiers

Local EPrints ID: 76570
URI: http://eprints.soton.ac.uk/id/eprint/76570
ISBN: 1-55752-595-1
PURE UUID: 4e1c9c06-6287-4519-aa9b-951f62f2b2ea
ORCID for R.W. Eason: ORCID iD orcid.org/0000-0001-9704-2204

Catalogue record

Date deposited: 11 Mar 2010
Last modified: 18 Jul 2017 23:39

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