Barry, I.E., Eason, R.W. and Cook, G.
Light induced frustration of etching in Fe doped LiNbO3
Lasers and Electro-Optics 1999.
Conference on Lasers and Electro-Optics (CLEO '99)
Piscataway, United States,
Institute of Electrical and Electronics Engineers
Full text not available from this repository.
We report frustration of normal etching in iron doped lithium niobate by incident 488nm light. At intensities > 1 Wcm etching is fully suppressed. We report the techniques' resolution and the effect of applied electric fields
Actions (login required)