Nonlinear properties of silica for picosecond ultraviolet pulse

Ross, I.N., Barr, J.R.M. and Toner, W.T. (1989) Nonlinear properties of silica for picosecond ultraviolet pulse. Conference on Lasers and Electro-Optics (CLEO '89), Baltimore, Baltimore, United States. 28 Apr - 01 May 1989.

Record type: Conference or Workshop Item (Paper)

Abstract

The development of excimer lasers has led to the generation of very high power pulses in the UV. There is a potential for large increases in currently achieved power levels and a great deal of interest in conducting experiments with such ultrahigh power short duration pulses. As at longer wavelengths UV lasers are ultimately power-limited devices, the limit on power being due to optical nonlinear processes occurring in the materials of the laser and experimental arrangement, induced by the beam itself and degrading the quality or reducing the energy of the beam. Measurements of two-photon absorption at 249, 266, and 351 nm have been carried out on several materials, and the nonlinear refractive index has been measured at 351 nm. However, there is a need for further evidence to enable a proper design of UV lasers and on assessment of their power-limited performance.

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