Ablated gratings on borosilicate glass by 193nm excimer laser radiation
Ablated gratings on borosilicate glass by 193nm excimer laser radiation
Relief gratings of 500nm period have been fabricated on Er/Yb-doped borosilicate glass substrates by laser ablation using an excimer laser at a wavelength of 193nm and a modified Mach-Zehnder interferometer. The grating fabrication process has been quantified using diffraction efficiency measurements and atomic force microscope microscans, and related to the incident energy density.
S739-S741
Pissadakis, S.
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Reekie, L.
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Hempstead, M.
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Zervas, M.N.
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Wilkinson, J.S.
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December 1999
Pissadakis, S.
a91c54e0-3b8d-479f-b44e-e678bc34a277
Reekie, L.
ec314137-6924-44ad-86a4-ff3f9a67c1b5
Hempstead, M.
1bc4f2eb-fba7-46b8-b0c6-199f586b9954
Zervas, M.N.
1840a474-dd50-4a55-ab74-6f086aa3f701
Wilkinson, J.S.
73483cf3-d9f2-4688-9b09-1c84257884ca
Pissadakis, S., Reekie, L., Hempstead, M., Zervas, M.N. and Wilkinson, J.S.
(1999)
Ablated gratings on borosilicate glass by 193nm excimer laser radiation.
Applied Physics A: Materials Science & Processing, 69 (7), .
(doi:10.1007/s003390051519).
Abstract
Relief gratings of 500nm period have been fabricated on Er/Yb-doped borosilicate glass substrates by laser ablation using an excimer laser at a wavelength of 193nm and a modified Mach-Zehnder interferometer. The grating fabrication process has been quantified using diffraction efficiency measurements and atomic force microscope microscans, and related to the incident energy density.
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1877
- Author's Original
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Published date: December 1999
Organisations:
Optoelectronics Research Centre
Identifiers
Local EPrints ID: 77795
URI: http://eprints.soton.ac.uk/id/eprint/77795
ISSN: 0947-8396
PURE UUID: 86168327-93b0-4f4c-b67b-cc8c29267511
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Date deposited: 11 Mar 2010
Last modified: 14 Mar 2024 02:35
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Author:
S. Pissadakis
Author:
L. Reekie
Author:
M. Hempstead
Author:
M.N. Zervas
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