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Photorefractive damage removal in annealed-proton-exchanged LiNbO3 channel waveguides

Robertson, Elaine E., Eason, Robert W., Yokoo, Yoshiatsu and Chandler, Peter J. (1997) Photorefractive damage removal in annealed-proton-exchanged LiNbO3 channel waveguides Applied Physics Letters, 70, (16), pp. 2094-2096.

Record type: Article

Abstract

Ion beam implantation has been used as a postprocessing technique to dramatically reduce the photorefractive effect in lithium niobate channel waveguides. The waveguides were fabricated by proton exchange and then annealed 1.0 MeV H+ ions were implanted through the existing channel waveguides such that the "damaged layer" was created beneath the existing channel waveguide. The output characteristics from the waveguides were subsequently examined. Highly stable, single-mode outputs were observed with the waveguides retaining up to 95% of their original transmission. It is thought that this decrease in photorefractive susceptibility can be explained by the implant changing the defect structure and hence photovoltaic properties of the material

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Published date: April 1997

Identifiers

Local EPrints ID: 78021
URI: http://eprints.soton.ac.uk/id/eprint/78021
ISSN: 0003-6951
PURE UUID: aeafae3b-1816-486f-9204-502f46a48321
ORCID for Robert W. Eason: ORCID iD orcid.org/0000-0001-9704-2204

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Date deposited: 11 Mar 2010
Last modified: 18 Jul 2017 23:27

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Contributors

Author: Elaine E. Robertson
Author: Robert W. Eason ORCID iD
Author: Yoshiatsu Yokoo
Author: Peter J. Chandler

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